Thermoluminescence properties of TiO2/Cu/TiO2 multilayer thin films fabricated by (RF/DC) sputtering for radiation dosimetry

Idriss, Ali Saleh Alkadem; Razak, Nik Noor Ashikin Nik Ab; Ahmed, Naser M.; Abdulla, Youssef Aboubaker

doi:10.1016/j.jlumin.2023.119886

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2024

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“…This was true for films deposited at the highest (3.47 Pa) and lowest (0.47 Pa) working pressures, which showed peaks at different 2θ positions. In contrast, the films obtained at pressures of 1.27 and 2.13 Pa had amorphous structures, which are common in sputtering deposits over glass substrates [ 32 , 42 , 49 , 50 ]. For this reason, a Rietveld refinement was performed to determine the lattice parameters and the phases resulting from the deposition conditions ( Table S3 ).…”

Section: Resultsmentioning

confidence: 99%