2018
DOI: 10.1016/j.ceramint.2018.05.135
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Thermophysical and radiative properties of pressureless sintered SiC and ZrB2-SiC laminates

Abstract: The evaluation of thermal and radiative properties of materials to be used as a hot part of thermal protection systems is a key issue for the design process of the HTC and UHTC components. Ceramic laminates with composition 100 vol%SiC and 80 vol%ZrB 2-20 vol%SiC were prepared by the tape casting technique and pressureless sintered. Thermal properties such as the thermal expansion coefficient, specific heat, thermal diffusivity and conductivity were measured; in addition the total emissivity was evaluated. A c… Show more

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Cited by 10 publications
(5 citation statements)
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“…The maximum hemispherical emittance of this coating was recorded as ϵ h = 0.90 at 600 • C. This high emittance value can be attributed to the presence of unoxidized SiC. SiC is known for its high total hemispherical emittance values (ϵ h = 0.81-0.84) in the temperature range of 500-1300 • C. 48 The plasma-sprayed ZrB 2 -SiC sample demonstrated its next high emittance value (ϵ h = 0.80) at around ∼1000-1200 • C, due to the formation of the SiO 2 -abundant glassy layer. The emittance test in this study was performed up to 1200 • C using a calorimetric F I G U R E 9 ZrB 2 -SiC oxidation reaction sequence according to the model proposed by Fahrenholtz.…”
Section: 11mentioning
confidence: 85%
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“…The maximum hemispherical emittance of this coating was recorded as ϵ h = 0.90 at 600 • C. This high emittance value can be attributed to the presence of unoxidized SiC. SiC is known for its high total hemispherical emittance values (ϵ h = 0.81-0.84) in the temperature range of 500-1300 • C. 48 The plasma-sprayed ZrB 2 -SiC sample demonstrated its next high emittance value (ϵ h = 0.80) at around ∼1000-1200 • C, due to the formation of the SiO 2 -abundant glassy layer. The emittance test in this study was performed up to 1200 • C using a calorimetric F I G U R E 9 ZrB 2 -SiC oxidation reaction sequence according to the model proposed by Fahrenholtz.…”
Section: 11mentioning
confidence: 85%
“…This high emittance value can be attributed to the presence of unoxidized SiC. SiC is known for its high total hemispherical emittance values ( ϵ h = 0.81–0.84) in the temperature range of 500–1300°C 48 . The plasma‐sprayed ZrB 2 ‐SiC sample demonstrated its next high emittance value ( ϵ h = 0.80) at around ∼1000–1200°C, due to the formation of the SiO 2 ‐abundant glassy layer.…”
Section: Radiative Properties Of Uhtcmentioning
confidence: 96%
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“…Today, the synthesis of silicon carbide nanoparticles has become widespread among scientists around the world. There are many developed methods for the synthesis of silicon carbide nanoparticles, for example: sintering [13][14][15][16][17][18][19], combustion [20,21], selective method [22], sol-gel method [23][24][25][26], hydrothermal acid leaching [27], pyrolysis [28][29][30], pyrohydrolysis [31], low temperature synthesis [32,33], microwave synthesis [34][35][36][37], chemical vapor deposition [38][39][40][41][42], in situ growth [43,44], electric arc synthesis [45,46], etc.…”
Section: Silicon Carbide Synthesis Methodsmentioning
confidence: 99%