Amorphous
transparent oxide semiconductor InGaZnO4 (IGZO)-based
thin-film transistors (TFTs) have been practically used as the backplane
of flat panel displays. For future higher-definition displays, alternative
active materials with a higher field effect mobility (μFE) are necessary. Although there are a few reports on InGaO3(ZnO)
m
with Zn-rich composition
(IGZO
m
)-based TFTs, their electron transport
properties have not been clarified. Here, we show that a Zn-rich composition
enhances the electron transport properties of IGZO
m
-TFTs. The best TFT performance was obtained for m = 7 (μFE ∼12 cm2 V–1 s–1, subthreshold swing ∼0.1 V decade–1, and a negligibly small bias stress shift). The carrier
effective mass (m*) of IGZO
m
films was found to be 0.16 m
0,
independent of the m-value. We found that μFE of IGZO
m
-TFT increased with
the m-value for m ≤ 7, whereas
it decreased for m > 7 due to the crystallization.
The thermopower modulation analyses revealed that the effective channel
thickness increased with m (m ≤
7), which resulted in a longer carrier relaxation time. The present
results provide an improving strategy toward new material design for
next-generation TFTs with higher μFE values.