2019
DOI: 10.1016/j.jcrysgro.2019.06.032
|View full text |Cite
|
Sign up to set email alerts
|

Thick hydride vapor phase epitaxial growth of ZnSe on GaAs (1 0 0) vicinal and orientation patterned substrates

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
8
0

Year Published

2019
2019
2023
2023

Publication Types

Select...
5
1

Relationship

2
4

Authors

Journals

citations
Cited by 10 publications
(8 citation statements)
references
References 17 publications
0
8
0
Order By: Relevance
“…As for the case of ZnSe/GaAs, the critical thickness must be significantly larger due to the much smaller lattice mismatch of only +0.238% (see Table 2). However, as it was already discussed, in spite of the sharp ZnSe/GaAs interface stacking faults in the ZnSe layer along {111} that originate still from the GaAs substrates [96] (Figure 30) were observed (in opposite to the case of GaP/GaAs) near the interface well below the predicted in [97] critical thickness of about 41 nm, suggesting that their formation is, namely, the mechanism of strain release in the ZnSe/GaAs case. Obviously, during a faster (HVPE) growth in both cases the strain built in result of the lattice mismatch can be released in different ways, which could postpone for a later stage of growth the formation of MDs, or even entirely to replace it.…”
Section: Some Crystal Growth Considerationsmentioning
confidence: 72%
See 4 more Smart Citations
“…As for the case of ZnSe/GaAs, the critical thickness must be significantly larger due to the much smaller lattice mismatch of only +0.238% (see Table 2). However, as it was already discussed, in spite of the sharp ZnSe/GaAs interface stacking faults in the ZnSe layer along {111} that originate still from the GaAs substrates [96] (Figure 30) were observed (in opposite to the case of GaP/GaAs) near the interface well below the predicted in [97] critical thickness of about 41 nm, suggesting that their formation is, namely, the mechanism of strain release in the ZnSe/GaAs case. Obviously, during a faster (HVPE) growth in both cases the strain built in result of the lattice mismatch can be released in different ways, which could postpone for a later stage of growth the formation of MDs, or even entirely to replace it.…”
Section: Some Crystal Growth Considerationsmentioning
confidence: 72%
“…Competing growth rates on different planes of the growing crystal are partly responsible for one Figure 30. High-resolution TEM image of the ZnSe/GaAs interface (reproduced from [96] with some modifications with the permission of J. Cryst. Growth).…”
Section: Growth Of Znse On Gaas and On Op-gaas Templatesmentioning
confidence: 99%
See 3 more Smart Citations