2007
DOI: 10.1117/12.737110
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Thick low-loss orientation-patterned gallium arsenide (OP-GaAs) samples for mid-infrared laser sources

Abstract: Nonlinear optical materials play a key role in the development of coherent sources of radiation as they permit the frequency conversion of mature solid-state lasers into spectral ranges where lasers do not exist or perform poorly. The availability of efficient quasi-phasematched infrared materials is thus considered as important for the development of several defense optronics applications. This paper will review the recent progresses we achieved with thick Orientation Patterned-GaAs structures. We will presen… Show more

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Cited by 6 publications
(7 citation statements)
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“…We used an OP-GaAs crystal grown by Hydride Vapour Phase Epitaxy (HVPE) [29,30], the method of choice for achieving fast growth rates with excellent selectivity so as to produce thick OP-GaAs structures for QPM frequency conversions. The epitaxial growth on orientationpatterned semiconductor crystals requires templates with modulated crystalline orientation, which constitute the seeds for the epitaxial regrowth.…”
Section: The Orientation-patterned Gaas Samplementioning
confidence: 99%
“…We used an OP-GaAs crystal grown by Hydride Vapour Phase Epitaxy (HVPE) [29,30], the method of choice for achieving fast growth rates with excellent selectivity so as to produce thick OP-GaAs structures for QPM frequency conversions. The epitaxial growth on orientationpatterned semiconductor crystals requires templates with modulated crystalline orientation, which constitute the seeds for the epitaxial regrowth.…”
Section: The Orientation-patterned Gaas Samplementioning
confidence: 99%
“…However, improvement in growing techniques of quasi-phase-matched (QPM) orientation-patterned GaAs (OP-GaAs) crystals permitted efficient demonstration of second-harmonic generation [6], difference frequency generation and optical parametric oscillation [7][8][9]. OP-GaAs fabrication process utilizes a dedicated pressure oven adapted to accept 2 inches wafers [1,9]. Gratings in 2 inches-wafers are fabricated by standard photolithography and subsequent dry etching [1,9].…”
Section: Introductionmentioning
confidence: 99%
“…OP-GaAs fabrication process utilizes a dedicated pressure oven adapted to accept 2 inches wafers [1,9]. Gratings in 2 inches-wafers are fabricated by standard photolithography and subsequent dry etching [1,9]. Then, a near-equilibrium technique, the atmospheric-pressure hydride vapor-phase epitaxy (HVPE), allows depositing additional material onto the pre-orientated substrates with perfect conservation of initial template crystallographic inversion with growth rates up to 30 µm/h.…”
Section: Introductionmentioning
confidence: 99%
“…For example, Schlossberg et al placed a series of GaAs plates at Brewster's angle [6] and Gordon et al manually polished, sliced and stacked GaAs pieces [7] but those processes resulted in too much loss to be useful in an OPO. About 10 years ago, a challenging multistep all-epitaxial process for fabrication of useful orientation-patterned GaAs has been developed for quasi-phasematched nonlinear optics [8][9][10][11][12]. First, it requires templates whose surface contains a modulation in crystalline orientation.…”
Section: Introductionmentioning
confidence: 99%