Thin Film Chromium Coating on Glass Substrate Optimized by Taguchi Method

Abstract

The sputtering technique used for deposition of thin film metallized product onto base substrate material. The experiment was conducted to deposit thin film Cr-coating on glass substrate with varying process parameters. The design of experiment (DOE) was conducted to optimize the process parameters to achieve defect-free coating on glass substrate. Taguchi fractional factorial orthogonal array was used to perform DOE & ANOVA analysis. The deposition of chromium metal on glass substrate was used during the experiments conducted. The results of the experiments were evaluated against quality of the coating and the thickness. Detailed ANOVA analysis has been performed to standardize the variables.