2000
DOI: 10.1109/27.901230
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Thin-film deposition of (Ba/sub x/Sr/sub 1-x/)TiO/sub 3/ by pulsed ion beam evaporation

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Cited by 3 publications
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“…The interaction between an ion beam and a plasma plays a basic role in many applications in various fields. Ion beams are used in confinement fusion, high-energy boosters, plasma X-ray sources, surface modification, preparation of thin films, excitation of high-power short-wavelength lasers, and so on [18]- [21]. Furthermore, the ion beam can drive instabilities in the plasma, and these instabilities not only occur in laboratory plasmas [22] but also have been observed in space plasma in the foreshock region of the Earth's bow shock [23], [24].…”
Section: Introductionmentioning
confidence: 97%
“…The interaction between an ion beam and a plasma plays a basic role in many applications in various fields. Ion beams are used in confinement fusion, high-energy boosters, plasma X-ray sources, surface modification, preparation of thin films, excitation of high-power short-wavelength lasers, and so on [18]- [21]. Furthermore, the ion beam can drive instabilities in the plasma, and these instabilities not only occur in laboratory plasmas [22] but also have been observed in space plasma in the foreshock region of the Earth's bow shock [23], [24].…”
Section: Introductionmentioning
confidence: 97%