Thin film growth by the pulsed laser assisted deposition technique

Belouet, C.

doi:10.1016/0169-4332(95)00535-8

Cited by 39 publications

(13 citation statements)

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“…Ce processus parasite constitue aujourd'hui une limitation importante au développement industriel de la technique PLD. Le principe de cette technique, objet de nombreux articles de revue [4][5][6][7][8], est illustré dans la figure 1. Ce procédé occupe une niche étroite parmi l'ensemble des techniques de traitement de la matière par irradiation au moyen d'un laser puisé.…”

Section: Le Principeunclassified

“…Dans ces conditions, il existe plusieurs processus intrinsèques à la technique PLD, qui sont susceptibles de déstabiliser la surface liquide et de projeter ainsi des gouttelettes de taille micrométrique : la force d'inertie due à la propagation de l'interface solide-liquide, la dilatation d'origine thermique de la cible et éventuellement, l'approche de l'état critique. De nombreuses solutions techniques ont été proposées pour prévenir le dépôt des gouttelettes sur le film [8], les plus satisfaisantes d'entre elles étant probablement mécaniques [55], L'utilisation de cibles liquides, en éliminant le processus de changement de phase et en maintenant un état de surface quasi parfait, réduit considérablement la densité de gouttelettes et permet par ailleurs une simplification du dispositif de balayage de la cible par le faisceau laser [16,56]. Cette possibilité, utilisée par l'un des auteurs pour le dépôt de HgBa 2 CaCujO y -cible de Hg liquide-, n'est cependant ni universelle ni exempte de défauts.…”

Section: L'émission De Gouttelettesunclassified

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Dépôt de films minces par ablation laser, le potentiel industriel

et al. 1997

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Section: Le Principeunclassified

Section: L'émission De Gouttelettesunclassified

Dépôt de films minces par ablation laser, le potentiel industriel

et al. 1997

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“…The PLD technique -pulsed laser deposition has been applied in 80-thies and is still under expansion for practical applications [4][5][6]. As shown in our previous paper [7] in case of the PLD technique, the target material is placed inside a chamber with a controlled atmosphere (vacuum or reactive gas) where is irradiated, through an optical window by a high fluency, focused, laser beam.…”

Section: Introductionmentioning

confidence: 99%

“…In general, the thin film deposition process, involves evaporation of material (being in the form of a solid target) by pulsed laser beam of very short duration (from micro-to nano-and even femtoseconds) focused on the material surface (target) and of very high fluence and then vapor deposition and thin film growth on the substrate. The dominant mechanisms involved in the formation of a hot plasma from the irradiated surface were found to depend sensitively on laser parameters such as the energy density (fluence), pulse duration, wavelength, polarization, laser repetition rate, as well as the properties of irradiated material [4][5][6][7][8]. The laser's temporal pulse length can have a significant effect on the dynamics of the ablation process.…”

Section: Introductionmentioning

confidence: 99%

Deposition Of Oxide And Intermetallic Thin Films By Pulsed Laser (PLD) And Electron Beam (PED) Methods

Kusiński¹,

Kopia²,

Cieniek³

et al. 2015

Archives of Metallurgy and Materials

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In this work the pulsed laser deposition (PLD) and the pulsed electron beam deposition (PED) techniques were used for fabrication of Mo-Bi 2 O 3 , La 1-x Sr x CoO 3 , La 1-x Ca x CoO 3 and Al-Mg thin films. An influence of ablation process basic parameters on the coatings structure and properties was discussed. Two types of laser ablation systems were applied: one equipped with a KrF excimer and second with a Q-switched Nd:YAG. Films were deposited on Si and MgO substrates. Scanning (SEM) and transmission (TEM) electron microscopy, atomic force microscopy (AFM) as well as X-ray diffraction (XRD) were used for structural analysis. Investigations focused on structure and chemical composition showed that smooth and dense thin films with nanocrystalline structure, preserving the composition of the bulk target, could be obtained by the both PLD and PED techniques. Research study showed that by a proper selection of PLD and PED process parameters it was possible to deposit films with significantly decreased amount and size of undesirably nanoparticulates.Keywords: PLD, PED, thin films, structure, doped oxidesOsadzanie laserem impulsowym (PLD) oraz osadzanie impulsową wiązka elektronową (PED) wykorzystane zostało do wytwarzania cienkich filmów typu: Mo-Bi 2 O 3 , La 1-x Sr x CoO 3 , La 1-x Ca x CoO 3 oraz Al-Mg. Dyskutowano wpływ podstawowych parametrów procesu ablacji na strukturę i właściwości uzyskiwanych powłok. Wykorzystane zostały dwa typy systemów do ablacji; jeden z ekscymerowym laserem KrF i drugi na bazie lasera Nd:YAG z modulatorem dobroci (Q-Switch). Filmy osadzano na podłożu Si i MgO. Skaningowa (SEM) i transmisyjna (TEM) mikroskopia elektronowa, mikroskopia sił atomowych (AFM), oraz dyfrakcja rentgenowska (XRD) wykorzystana została do analizy strukturalnej. Badania skoncentrowane na strukturze i skła-dzie chemicznym wykazały jednorodną i zwartą budowę cienkich nanokrystalicznych filmów uzyskanych metodami PLD i PED utrzymujących skład odparowywanych tarcz. Wykazano doświadczalnie, że odpowiednie dobranie parametrów procesu pozwala otrzymywać filmy o istotnym zminimalizowaniu ilości i wymiarów niekorzystnych nanocząstek w powłoce.

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“…The processes leading to pulsed-laser generated gas clouds have been extensively studied and modeled for thin film deposition [23,24]. We begin with a widely accepted hydrodynamical model [25] which consists of an initial elliptical gas cloud generated by desorption from a surface plasma that rapidly (t eq 100 ns) equilibrates to a full Maxwell-Boltzmann distribution.…”

Section: Modeling Absorption Spectroscopy With Ablated Moleculesmentioning

confidence: 99%

BaH molecular spectroscopy with relevance to laser cooling

2016

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We describe a simple experimental apparatus for laser ablation of barium monohydride (BaH) molecules and the study of their rovibrational spectra that are relevant to direct laser cooling. We present a detailed analysis of the properties of ablation plumes that can improve the understanding of surface ablation and deposition technologies. A range of absorption spectroscopy and collisional thermalization regimes has been studied. We directly measured the Franck-Condon factor of the B 2 Σ + (v = 0) ← X 2 Σ + (v = 1) transition. Prospects for production of a high luminosity cryogenic BaH beam are outlined. This molecule is a promising candidate for laser cooling and ultracold fragmentation, both of which are precursors to novel experiments in many-body physics and precision measurement.

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Thin film growth by the pulsed laser assisted deposition technique

Cited by 39 publications

References 100 publications

Dépôt de films minces par ablation laser, le potentiel industriel

Dépôt de films minces par ablation laser, le potentiel industriel

Deposition Of Oxide And Intermetallic Thin Films By Pulsed Laser (PLD) And Electron Beam (PED) Methods

BaH molecular spectroscopy with relevance to laser cooling

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