Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference - 2000 (Cat. No.00CH37036)Help me understand this report
Thin film poly-Si solar cells prepared by PECVD using very high excitation frequency
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“…The most common technique is using chemical vapor deposition (CVD). Plasma enhanced CVD (PECVD) technique is useful to obtain poly-Si when the hydrogen content is carefully adjusted [9][10][11][12][13][14][15][16]. Furthermore, low pressure CVD (LPCVD) can also be used for the purpose, but it requires high temperature [17][18][19][20][21][22].…”
Section: The Polycrystalline Silicon Thin Filmmentioning
confidence: 99%
“…The most common technique is using chemical vapor deposition (CVD). Plasma enhanced CVD (PECVD) technique is useful to obtain poly-Si when the hydrogen content is carefully adjusted [9][10][11][12][13][14][15][16]. Furthermore, low pressure CVD (LPCVD) can also be used for the purpose, but it requires high temperature [17][18][19][20][21][22].…”
Section: The Polycrystalline Silicon Thin Filmmentioning
confidence: 99%
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