Thin film processing using S-layer proteins: Biotemplated assembly of colloidal gold etch masks for fabrication of silicon nanopillar arrays

Entropically Driven Self‐Assembly of Lysinibacillus sphaericus S‐Layer Proteins Analyzed Under Various Environmental Conditions

“…When the boundaries of two or more growing crystalline domains come into contact, the adjacent sites for the incorporation of new monomers become buried, and further assembly at those points ceases. Although polycrystalline types of S-layer matrices provides a configuration with a minimum free energy condition, they are generally not viewed as being ideal for certain nanobiotechnological applications [27][28][29] in which a monocrystalline domain would be more beneficial (e.g., the creation of long-range ordered periodic arrays of nanoparticles for studying the collective optoelectronic effects of nanoscale ordering).…”

“…[27][28][29][30] there is currently no high-resolution structural data of a full protein available for members of this class of proteins. [31][32][33] Because of this lack of structural information, recently cysteine residues were incorporated by point mutations on the S-layer protein from Geobacillus stearothermophilus PV72/p2 to be used to map the location of those individual residues in the protein surface.…”

Combining Micelle Self‐Assembly with Nanostencil Lithography to Create Periodic/Aperiodic Micro‐/Nanopatterns on Surfaces

“…Au nanoparticles organized using S-layer proteins has been shown useful as a mask for creating Si nanopillars. [36] Such structuring means, although interesting, have so far only been shown for isolated and small areas on surfaces. Copolymer-derived etch masks have been used as templates to structure technologically important substrates, such as Si, SiO 2 , Si 3 N 4 , and GaAs in the sub-100 nm scale.…”

“…The nanostructures presented here are silicon nanopillars created with the use of diblock copolymer micelles as dry etch masks. [33] Earlier, several approaches have been shown to create nanopillars on surfaces, using self-assembly approaches, such as nanosphere lithography (NSL), [34,35] S-layer proteins, [36] copolymer phase separated thin films, [37] and micelles. [33,38] Each of these techniques possess complementary advantages.…”

Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching

“…The most commonly used is nanosphere lithography (NSL) [9][10][11][12][13], which has been demonstrated as an efficient way to produce nanoscale patterns over a large area with high throughput and low cost. Nanospheres can be introduced onto substrates by spin-coating [14] or created during annealing a thin metallic (Au) layer [15], or linked on wafers using self-assembling [16]. However, the shapes and the sizes of the nanoparticles created by these techniques are not as well defined as the features created by using traditional lithography, and the placing of the nanoparticles is also inexact.…”