We report the growth of a nanospiked, carbon thin film electrode by an inexpensive, non-catalytic plasma enhanced CVD process on Si substrates. The electron transfer kinetics for various redox probes of these carbon nanospikes (CNS) were determined and compared with glassy carbon and CNS exposed to oxygen plasma or a high temperature ammonia soak. The results indicate that CNS can be used as a practical alternative to GC for various electroanalysis applications. These electrodes also exhibited activity and stability toward the oxygen reduction reaction, suggesting there potential use as electrocatalyst supports. Finally, the ability to deposit conformal thin films of CNS on a 3-D architecture for use as an electrode was demonstrated. Carbon electrodes are commonly used in electrochemical applications such as sensing and electrocatalysis. This class of electrode is often touted for being inexpensive, highly conductive, electrochemically stable, amenable to surface chemistry modifications, and having a wide electrochemical window. While the electrochemistries of standard carbon electrodes like glassy carbon and carbon black have been thoroughly studied, newly developed nanoscale carbon materials present a potent new class of carbon electrodes to explore. A great deal of attention has focused on highly ordered carbon nanomaterials like graphene 1-3 and carbon nanotubes, 4 in addition to less ordered carbons like pyrolized graphite, 5 carbon foams 6 and fibers.
7One approach to forming nanoscale carbon electrodes is through thin film deposition, which can produce free standing electrodes for easy incorporation into sensors, microelectronic components, and energy storage and conversion devices. Carbon thin films having a range of structural and electrochemical properties have been formed by techniques including photoresist pyrolysis, 8-10 sputtering, 11,12 and pulsed laser-arc deposition, 13 among others. Chemical vapor deposition (CVD), which is best known for its use in the microelectronics industry for fabricating thin films of semiconductors, metals, alloys and dielectrics, is another option for carbon thin film formation. Fundamental research into CVD technologies led to the development of numerous variations, such as metal-organic CVD (MOCVD) and plasma-enhanced CVD (PECVD). CVD in its various forms has been used since the mid-90's to synthesize nanostructured carbons including carbon nanotubes, 14 Nanostructured electrodes -those with controlled architectures at the nanoscale -often possess high surface area, tunable surface functionality, increased electrocatalytic activity, spatial control and unique diffusion properties (which can lead to higher sensitivity).
19Here we report the formation and electrochemical characterization of nanostructured carbon thin film electrodes, which we refer to as carbon nanospikes (CNS) due to the primary morphological characteristic of tapered spikes approximately 50 nm in length. The nanospikes herein are grown on Si wafer using non-catalytic PECVD in the presence of ammon...