Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering

Yamagishi, Makiko; Kuriki, Shna; Song, Pung Keun; Shigesato, Yuzo

doi:10.1016/s0040-6090(03)00987-8

Cited by 190 publications

(95 citation statements)

References 12 publications

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“…Besides, it has been reported that the kinetic energy of the particles, such as oxygen negative ions and sputtered atoms, depends on the collision frequency among the oxygen gas molecules, oxygen negative ions and sputtered atoms [15,16].…”

Section: Methodsmentioning

confidence: 99%

See 1 more Smart Citation

Microstructure Analysis and Optimization of Sputter-Deposited Zinc Oxide Thin Films Used in Low-Emissivity Coatings for Energy Efficient Windows

Kato

Omoto

Takamatsu

2010

Trans. Mat. Res. Soc. Japan

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ZnO thin films were deposited with changing oxygen gas pressure and their microstructures were investigated by the glancing incident X-ray reflectivity measurement. It was found that the ZnO thin films exhibited higher packing density and smoother surface morphology, when they were deposited in lower oxygen gas pressure. These microstructure improvements of ZnO thin films with decreasing in oxygen gas pressure should come from the increase in the kinetic energy of sputtered Zn atoms and gas particles such as oxygen negative ions recoiled from the sputtering target surface.Furthermore, the double-layered low-emissivity coatings consisting of glass/ZnO/Ag were also prepared and the correlation between the microstructure of ZnO thin films and the electrical property of the Ag thin films was clarified. The Ag thin films exhibited low electrical resistivity when the ZnO thin films deposited in low oxygen gas pressure were used. It can be considered that this improvement in the Ag resistivity is attribute to the high packing density and smooth surface of the ZnO thin film.

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Section: Methodsmentioning

confidence: 99%

“…In order to clarify the influence of oxygen gas pressure on the collision frequency and kinetic energy of gas particles, the kinetic energy of oxygen negative ion and sputtered Zn atom were estimated using Kevin-Meyer's equation given as follows [15][16][17]:…”

Section: Methodsmentioning

confidence: 99%

Microstructure Analysis and Optimization of Sputter-Deposited Zinc Oxide Thin Films Used in Low-Emissivity Coatings for Energy Efficient Windows

Kato

Omoto

Takamatsu

2010

Trans. Mat. Res. Soc. Japan

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“…In general, ceramic films are deposited on several substrates by methods such as plasma spraying, sputtering and sol-gel [5,6]. Although these conventional methods are well developed, the coatings are generally carried out at high temperatures, which can lead to deterioration of the mechanical properties in titanium-based alloys.…”

Section: Introductionmentioning

confidence: 99%

Photo-Induced Formation of Hydroxyapatite on Titanium Oxides in Simulated Body Fluid

Ueda

Sai

Arachi

et al. 2010

Trans. Mat. Res. Soc. Japan

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Hydroxyapatite (HAp), Ca 10 (PO 4 ) 6 (OH) 2 , is known to precipitate on bioactive materials such as TiO 2 and CaTiO 3 by soaking in simulated body fluid (SBF). The formation of HAp on TiO 2 surfaces under continuous ultraviolet (UV) irradiation was investigated. Anatase-type TiO 2 film was synthesized on pure Ti substrates by a combined chemical-hydrothermal treatment. The specimens were immersed in SBF in darkness or under UV irradiation with a centered wavelength of = 365 nm. Under dark conditions, a thin homogeneous HAp film was formed, with just a few spherical clusters of HAp. The UV irradiation promoted the formation of HAp clusters, which may be due to the generation of functional Ti-OH or Ti-O  groups on the TiO 2 surface. The UV light produces electron-hole pairs in the TiO 2 . When an n-type semiconductor is immersed in an aqueous solution, an up-hill potential gradient is produced towards the surface in the conduction and the valence bands. Therefore, the photogenerated holes migrate to the surface and repel the Ca 2+ ions in the solution near the surface of TiO 2 . As a consequence, the UV irradiation suppressed the formation of a HAp thin film.

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“…From a practical perspective, in order to form a TiO 2ˆl m as a photocatalyst on a substrate such as glass, Sol-Gel 4) or vacuum evaporation 5) methods are currently used. More recently, sputtering has received particular attention for this application [6][7][8][9][10][11][12] . An advantage of this method over other methods is that it is eŠec-tive for forming high-quality thinˆlms uniformly over large areas with control of the microstructure to some extent on an atomic level.…”

Section: Introductionmentioning

confidence: 99%

Preparation of TiO2 Thin Film Photocatalyst by High-rate Low-temperature Sputtering Method

et al. 2010

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After depositing an ultra-thin metallic Tiˆlm by sputtering, we repeated the process of exposing the still active plasma gas for high-rate low-temperature deposition of a metal compoundˆlm, thereby successfully fabricating a thinˆlm of TiO 2 with photocatalytic properties. The TiO 2 thinˆlm produced using the present method exhibited approximately 15 times the deposition rate of DC reactive magnetron sputtering, yielding a crystalline structure using an unheated substrate (approximately 40°C).

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Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering

Cited by 190 publications

References 12 publications

Microstructure Analysis and Optimization of Sputter-Deposited Zinc Oxide Thin Films Used in Low-Emissivity Coatings for Energy Efficient Windows

Microstructure Analysis and Optimization of Sputter-Deposited Zinc Oxide Thin Films Used in Low-Emissivity Coatings for Energy Efficient Windows

Photo-Induced Formation of Hydroxyapatite on Titanium Oxides in Simulated Body Fluid

Preparation of TiO2 Thin Film Photocatalyst by High-rate Low-temperature Sputtering Method

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