Ullmann's Encyclopedia of Industrial Chemistry 2014
DOI: 10.1002/14356007.a26_681.pub2
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Thin Films

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Cited by 1 publication
(2 citation statements)
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“…The input of H 2 was calculated based on a typical gas composition of CH 4 and H 2 at 1 and 99 vol %, respectively. 54 It was assumed that all CH 4 input reacts into diamond in this process and that the H 2 (both from the input gas and from reaction R2) becomes vented to air via an exhaust system as indicated by Wahl et al 55 After the MWCVD synthesis, a diamond film with a specific thickness has been deposited on the substrate. The substrate was included in the unit-process data in this study as a part of the final product, i.e., a diamond film on a Si substrate.…”
Section: ■ Calculationsmentioning
confidence: 99%
See 1 more Smart Citation
“…The input of H 2 was calculated based on a typical gas composition of CH 4 and H 2 at 1 and 99 vol %, respectively. 54 It was assumed that all CH 4 input reacts into diamond in this process and that the H 2 (both from the input gas and from reaction R2) becomes vented to air via an exhaust system as indicated by Wahl et al 55 After the MWCVD synthesis, a diamond film with a specific thickness has been deposited on the substrate. The substrate was included in the unit-process data in this study as a part of the final product, i.e., a diamond film on a Si substrate.…”
Section: ■ Calculationsmentioning
confidence: 99%
“…The input of H 2 was calculated based on a typical gas composition of CH 4 and H 2 at 1 and 99 vol %, respectively . It was assumed that all CH 4 input reacts into diamond in this process and that the H 2 (both from the input gas and from reaction R2) becomes vented to air via an exhaust system as indicated by Wahl et al…”
Section: Calculationsmentioning
confidence: 99%