Thin permalloy film - bulk ferrite composite head for perpendicular magnetic recording

Fujiwara, Hideo; Shiiki, Kazuo; Shiroishi, Y.; Shinagawa, K.; Okuwaki, T.; Kudo, Mitsuhiro

doi:10.1109/tmag.1982.1061991

Cited by 13 publications

(3 citation statements)

References 6 publications

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“…Some thin-film single-pole heads with a small number of coil-turns have been proposed [3], [4] to realize high head efficiency by shortening the magnetic circuit path. In this paper, a single pole head with a thin film coil was investigated to provide information on the performance of a practical flying perpendicular head.…”

Section: Introductionmentioning

confidence: 99%

Extremely low inductance thin-film single-pole head on flying slider

et al. 1998

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A novel single-pole head on a flying slider is presented as a high frequency writing head. The main pole of the head is driven with three thin-film conductor layers to have a short magnetic circuit path. Thus, a low inductance of around 10 nH and a high writing sensitivity o f less than 0.03 AT,, is obtained. The writing field distribution is shown to be the same as a regular single-pole head by computer simulations. The recording performance of the head is examined and the high writing sensitivity is demonstrated.Index terms-perpendicular magnetic recording, inductive head, single-pole head, high frequency

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Section: Introductionmentioning

confidence: 99%

Extremely low inductance thin-film single-pole head on flying slider

et al. 1998

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“…Since the sensitivity of a single pole head depends on flux path length, one-turn coil single pole heads were proposed to shorten the flux path length [3], [4]. The former was mostly used for recording [3], and the latter was accompanied with a 1:4 close to the interface of head and media for improving the efficiency, was investigated.…”

Section: Introductionmentioning

confidence: 99%

Highly sensitive single pole head with laminated thin film coils

1995

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A novel single pole head with laminated thin film coils is proposed in this paper. Laminated thin film coils, between which a main pole is laid, are put very close to the media to capture most of the reproduced flux. In addition, a ferrite return yoke is placed just under the lower conductor to shorten the head magnetic flux path. These approaches bring high read/write efficiency and small head noise owing to low head impedance. With only one or twoturn coils, CO-Cr/Fe-Ni-Nb double-layered media were saturated at magneto-motive force of 0.05 ampere-turn, and overwrite of the two-turn head reached 35 dB. High normalized output of 1000 nVPJ!fm turn m/s was obtained. Much higher recording and reproducing sensitivity than ordinary inductive single pole heads was achieved.

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“…This oxide film is the result of passivating and insulating layers within the head and must be removed in the region of the recording gap prior to the deposition of the much thinner gap oxide spacer. The thin film head industry currently employs chemical etching (1), ion milling (2), or plasma etching (3) techniques to etch films of SiO2 or A1203. Even though wet etching offers selectivity to the underlying NiFe and high-process throughput, safety and waste disposal costs are significant considerations.…”

mentioning

confidence: 99%

Reactive Ion Etching of SiO2 in the Record Gap of Inductive Thin Film Heads

Macchioni

1990

J. Electrochem. Soc.

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A reactive ion etch process which was developed to remove SiO2 over Permalloy in the record gap of inductive thin film heads is described. Etch rates as high as 500 nm/min are easily achieved using C2F6 as the etch gas. The selectivity of the SiO2 etch process to the underlying layer of normalNiFe exceeds 200:1. Exposure of the normalNiFe film to the etch process has no measurable effect on its magnetic properties or surface roughness. The etch rate depends strongly on the power, pressure, and electrode gap, but not on the flow of C2F6 . At low flows, additions of SF6 and Ar to the process reduce the etch rate by reducing the gas residence time and diluting the etch species. At higher flows of SF6 , the etch rate is reduced due to a decrease in the sheath voltage. While additions of He and O2 have more complex effects on the etch rate, no practical increase in the SiO2 etch rate is achieved with either gas.

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Thin permalloy film - bulk ferrite composite head for perpendicular magnetic recording

Cited by 13 publications

References 6 publications

Extremely low inductance thin-film single-pole head on flying slider

Extremely low inductance thin-film single-pole head on flying slider

Highly sensitive single pole head with laminated thin film coils

Reactive Ion Etching of SiO2 in the Record Gap of Inductive Thin Film Heads

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