“…Taking our FePV synapse as an example, it consists of a simple two-terminal Pt/PZT (polycrystalline film)/LNO structure, which can be easily grown on a silicon substrate, demonstrating its good compatibility with the silicon technology. More generally, ferroelectric materials in any form (thin films, Tan et al, 2018;Yang et al, 2010;Qin et al, 2009;Chen et al, 2011;ceramics, Bai et al, 2018;He et al, 2019;single crystals, Blouzon et al, 2016;Alexe et al, 2011;etc.) can be used for constructing FePV synapses because of the universality of the FePV effect. By contrast, FTJs and FeFETs typically require the epitaxy growth (Chen et al, 2018; and careful optimization of the ferroelectric/semiconductor interface quality (Hoffman et al, 2010), respectively, and some of them are difficult to be integrated with the silicon substrate.…”