2023
DOI: 10.1039/d3ta04468h
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Thiophene-sulfur doping in nitrogen-rich porous carbon enabling high-ICE/rate anode materials for potassium-ion storage

Chuang Qiu,
Anuj Kumar,
Daping Qiu
et al.

Abstract: Sulfur doping in carbon materials is generally considered to enhance initial coulombic efficiency, potassium storage capacity and reaction kinetics.

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Cited by 7 publications
(2 citation statements)
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“…However, ZGHC1100 and ZGHC1300 exhibit combined type I/IV isotherms with noticeable uptake at P/P 0 < 0.02 and an obvious H4 hysteresis loop at 0.1 < P/P 0 < 1, indicating the presence of abundant micropores and mesopores. 28,29 This result suggests that the presence of Zn in the precursor can create numerous open pores in hard carbon samples. As the carbonization temperature increases, ZGHC1500 and ZGHC1600 have negligible 2e.…”
Section: Resultsmentioning
confidence: 90%
See 1 more Smart Citation
“…However, ZGHC1100 and ZGHC1300 exhibit combined type I/IV isotherms with noticeable uptake at P/P 0 < 0.02 and an obvious H4 hysteresis loop at 0.1 < P/P 0 < 1, indicating the presence of abundant micropores and mesopores. 28,29 This result suggests that the presence of Zn in the precursor can create numerous open pores in hard carbon samples. As the carbonization temperature increases, ZGHC1500 and ZGHC1600 have negligible 2e.…”
Section: Resultsmentioning
confidence: 90%
“…As shown in Figure S10, the isotherms with a negligible N 2 adsorption amount of GHC x show that they are all nearly open-pore-free materials. However, ZGHC1100 and ZGHC1300 exhibit combined type I/IV isotherms with noticeable uptake at P / P 0 < 0.02 and an obvious H4 hysteresis loop at 0.1 < P / P 0 < 1, indicating the presence of abundant micropores and mesopores. , This result suggests that the presence of Zn in the precursor can create numerous open pores in hard carbon samples. As the carbonization temperature increases, ZGHC1500 and ZGHC1600 have negligible N 2 adsorption amount, suggesting that they have almost no open pores.…”
Section: Resultsmentioning
confidence: 99%