2020
DOI: 10.1007/s10825-020-01498-2
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Three-dimensional analytical modeling for small-geometry AlInSb/AlSb/InSb double-gate high-electron-mobility transistors (DG-HEMTs)

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Cited by 3 publications
(1 citation statement)
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“…In the Asymmetric Silicon wafer DG-HEMT, the potential well or 2DEG is formed in the direction perpendicular to the interface of AlInSb and InSb layers because of its bandgap difference and ionized electrons are transferred from δ doped layer to InSblayer [5]. The transferred electrons are accumulated in the narrow bandgap material (InSb),so it is called potential well or two-dimensional electron gas (2DEG) [6].…”
Section: Introductionmentioning
confidence: 99%
“…In the Asymmetric Silicon wafer DG-HEMT, the potential well or 2DEG is formed in the direction perpendicular to the interface of AlInSb and InSb layers because of its bandgap difference and ionized electrons are transferred from δ doped layer to InSblayer [5]. The transferred electrons are accumulated in the narrow bandgap material (InSb),so it is called potential well or two-dimensional electron gas (2DEG) [6].…”
Section: Introductionmentioning
confidence: 99%