the GaN epitaxial layer quality, [8] the light trapping due to the total internal reflection (TIR) still limits the light extraction efficiency (LEE) of GaN. This is caused by the abrupt change in the refractive indices across the interface between GaN (n = 2.5) and the sapphire substrate (n = 1.8) or air (n = 1).Many approaches have been suggested for mitigating the TIR effect such as, surface texturing, [9][10][11][12][13] antireflection (AR) coatings, [14][15][16] and photonic crystal structures. [17,18] The top-down surface texturing techniques using dry or photoelectrochemical etching have demonstrated nearly twofold enhancement in the light output power (LOP). [19] However, these etching techniques have innate limitations for use in lateral LEDs because the top p-GaN layer is so thin (typically less than 200 nm) that the etching process for p-GaN must be exactly controlled to avoid degradation of the GaN LEDs. Therefore, bottom-up approaches such as AR coatings with graded refractive index [20] or photonic crystal structures [21] are typically utilized in the lateral LEDs.ZnO nanostructures are one of the most intensively investigated materials that are integrated on the surface of the LEDs for reducing the TIR without compromising the electrical properties. Various morphologies of ZnO nanostructures such as, nanorods (NR), nanowires, and hierarchical 3D nanostructures, typically grown by a hydrothermal technique, were suggested for enhancing the LEE of GaN LEDs. [22][23][24][25] Although the effective refractive index (n air = 1 < n < n ZnO_bulk = 2.0) of
Recently, 3D nanostructures have attracted much interest because of their interesting electrical/optical properties such as wave guiding modes, light scattering, antireflection effects, etc. In this work, a facile yet efficient method for the fabrication of hierarchical 3D indium tin oxide (ITO) nanotrees (NTs) and their integration in GaN-based blue-light-emitting diodes (LEDs) for efficient light-extraction are reported. The ITO NTs are fabricated by the obliqueangle (≈85°) deposition method at 240 °C using electron-beam evaporation. The ITO NTs grow via a self-catalytic vapor-liquid-solid mechanism with the branches having an epitaxial relationship with the trunks. The ITO NTs successively deposited on an ITO thin film as a p-contact layer are annealed at 600 °C for 1 min under ambient air in order to form a transparent ohmic contact. The indium gallium nitrde/gallium nitride (InGaN/GaN) LED with ITO NTs presents a 29.5% enhancement in the light output power at an injection current of 20 mA, compared to the reference LED with an ITO thin film p-contact. This enhancement is ascribed to the effective light extraction of the ITO NTs due to to the gradually decreasing profile of the refractive index from 2.08 (ITO thin film), 1.15 (dense ITO NTs), 1.06 (porous ITO NTs) to 1.0 (air). These results are in good agreement with the optical simulation by the COMSOL wave optics module.Figure 7. Light beam profile images of a) the reference and b) ITO-NT-integrate...