Three-dimensional microfabrication in bulk silicon using high-energy protons

Teo, Ee Jin; Breese, M.B.H.; Tavernier, E.P; Bettiol, A.A.; Watt, F.; Liu, M. H.; Blackwood, Daniel John

doi:10.1063/1.1723703

Cited by 79 publications

(43 citation statements)

References 21 publications

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“…In this way, any pattern of localized damage can be built up. This feature is used to produce three-dimensional multilevel structures in bulk p-type silicon [34]. , the magnetic scan is used directly.…”

Section: Free Standing Waveguidesmentioning

confidence: 99%

Silicon photonic waveguides for different wavelength regions

Mashanovich

Milosevic

Matavulj

et al. 2008

Semicond. Sci. Technol.

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In this paper we present our work on three silicon waveguide structures that are suitable for three different wavelength regions: near-, mid-and far-infrared. Design rules for standard rib SOI waveguides are given. Both single mode and polarisation independence in these waveguides are discussed. A hollow core waveguide suitable for gas sensing applications in the mid-infrared wavelength region is also analysed. Finally, fabrication and experimental results for free standing waveguides, which may find application in the mid and perhaps far-infrared wavelength region, are presented.

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Section: Free Standing Waveguidesmentioning

confidence: 99%

Silicon photonic waveguides for different wavelength regions

Mashanovich

Milosevic

Matavulj

et al. 2008

Semicond. Sci. Technol.

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“…Recently freestanding bridges, multilevel structures, and high aspect-ratio nanotips fabricated in silicon have been demonstrated by Breese et al 9 and Teo et al 10 Typically, a finely focused MeV proton beam is selectively scanned over the silicon surface. The high energy protons penetrate the silicon substrate and stop within a well-defined range.…”

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confidence: 99%

Freestanding waveguides in silicon

Yang

Mashanovich

Gomez-Morilla

et al. 2007

Applied Physics Letters

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Using a direct-write process for the production of three dimensional microstructures on a semiconductor, freestanding waveguides have been realized in silicon. The waveguides are produced by a focused beam of high energy protons that is scanned over a silicon substrate. The latent image of the scan is subsequently developed by electrochemical etching. Herein the authors report on the fabrication method as well as determining the propagation loss of these structures. Propagation loss values of 13.4 and 14.6 dB/ cm were obtained for these preliminary structures for transverse electric and transverse magnetic polarizations, respectively. © 2007 American Institute of Physics. ͓DOI: 10.1063/1.2749175͔Silicon photonics is experiencing a dramatic increase in interest due to emerging application areas and several breakthrough in device and technology development.1-5 Most conventional waveguides in silicon photonics are fabricated in the silicon-on-insulator ͑SOI͒ material system in the form of a strip or a rib waveguide. These waveguides, however, are not suitable for longer wavelengths ͑except in the 3 -3.5 m range͒ due to the absorption of the silicon dioxide insulating layer.6 Silicon-based long wave infrared photonics could find applications in several areas including sensing, communications, signal processing, missile detection, and imaging. To address these wavelengths, several different waveguide structures have been investigated such as photonic crystal, plasmon optic, hollow, and nanoslotted rib or strip waveguides. In this letter, the fabrication and propagation loss measurements of a different structure, the freestanding waveguide, are reported. As this waveguide has an air cladding, it is a viable structure for long wavelength applications.6 Alternatively, any other suitable cladding could easily be deposited to make the structures suitable for specific wavelength ranges.Proton beam writing ͑PBW͒ is an advanced lithographic technique for micromachining on the submicron scale. PBW utilizes a high energy ion microbeam to irradiate suitable resists ͓e.g., SU-8 and polymethyl methcrylate ͑PMMA͔͒. Subsequent wet etching is then employed to develop the resist. While it was initially investigated for producing latent microstructures in high molecular weight PMMA resist, Polesello et al. 7 and Mistry et al. 8 have demonstrated PBW as a method to fabricate three dimensional structures directly in Si and GaAs, respectively, thereby eliminating the need for a resist.There are several potential advantages of PBW. It is a direct-write process which eliminates the need for a potentially costly mask. Furthermore, prototype devices which require small structural modifications can be produced by simply modifying the scan of the microbeam whereas modifications to a device using photolithographic methods would require the layout and fabrication of an additional mask.A second benefit is that the protons are deposited in the semiconducting material in a well-defined range, thereby allowing for good vertical control of the fabric...

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“…Direct proton-beam irradiation is an emerging modification technique for fabricating waveguides in silicon and glass [6][7][8][9]. Figure 1 shows a schematic of the fabrication process, carried out using 250 keV protons of ϳ200 nm spatial resolution.…”

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confidence: 99%

Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation

et al. 2009

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We have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1 ϫ 10 15 /cm 2 after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1± 0.4 dB/ cm and 1.2± 0.4 dB/ cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications.

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Three-dimensional microfabrication in bulk silicon using high-energy protons

Cited by 79 publications

References 21 publications

Silicon photonic waveguides for different wavelength regions

Silicon photonic waveguides for different wavelength regions

Freestanding waveguides in silicon

Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation

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