Block
copolymer (BCP) nanopatterning has emerged as a versatile
nanoscale fabrication tool for semiconductor devices and other applications,
because of its ability to organize well-defined, periodic nanostructures
with a critical dimension of 5–100 nm. While the most promising
application field of BCP nanopatterning has been semiconductor devices,
the versatility of BCPs has also led to enormous interest from a broad
spectrum of other application areas. In particular, the intrinsically
low cost and straightforward processing of BCP nanopatterning have
been widely recognized for their large-area parallel formation of
dense nanoscale features, which clearly contrasts that of sophisticated
processing steps of the typical photolithographic process, including
EUV lithography. In this Review, we highlight the recent progress
in the field of BCP nanopatterning for various nonsemiconductor applications.
Notable examples relying on BCP nanopatterning, including nanocatalysts,
sensors, optics, energy devices, membranes, surface modifications
and other emerging applications, are summarized. We further discuss
the current limitations of BCP nanopatterning and suggest future research
directions to open up new potential application fields.