Three-layered sandwich structured carbon film prepared by sputtering and ion/electron/ion alternative irradiation

Zhang, Wenlei; Diao, Dongfeng; Fan, Xue

doi:10.1016/j.surfcoat.2015.08.001

Cited by 7 publications

(2 citation statements)

References 25 publications

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“…For instance, Xue et al [4,5] prepared carbon films with multilayer nanostructures by ECR plasma sputtering system, research results indicated that when the thickness of the carbon film monolayer decreased from 4 nm to 1 nm, the hardness of the multilayer film significantly increased. Study on sandwich multilayer carbon films found that as the thickness of the amorphous carbon film increased, the hardness of the sandwich structure multilayer film promoted [6]. Wang et al [7] prepared cross-linked graphene layer embedded carbon film, and the strong evidence was provided to clarify the friction coefficient decreasing mechanism of carbon film.…”

Section: Introductionmentioning

confidence: 99%

Structure and Surface Property of Carbon Films Deposited on Cemented Carbide by Electron Cyclotron Resonance Plasma Sputtering

Liu,

Shi,

Zhu

et al. 2023

Advances in Transdisciplinary Engineering

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With excellent properties in mechanics, optics and electricity, carbon film has been received much attention from the increasing scholars. In this study, we focus on the fabrication of carbon film on cemented carbide using electron cyclotron resonance (ECR) plasma sputtering. Electron irradiation and ion irradiation are achieved in ECR plasma sputtering system via the variations of substrate bias and magnetic coils to prepare carbon films, and then the structure, roughness, hardness and friction coefficient of carbon films are investigated. Analysis of Raman spectra indicates that the integrated intensity ratio (ID/IG) increases with the increment of positive substrate bias, but the minimum value of ID/IG occurs while substrate bias is -10 V. X-ray photoelectron spectroscopy (XPS) result shows that ion irradiation process can attain more sp3-C, which is beneficial to promote the hardness of carbon film. Roughness analysis reveals that step coverage effect appears in electron irradiation process, and friction experiments exhibit that carbon films prepared by electron irradiation process hold the lower and more stable friction coefficient. This study sheds light on the deposition of carbon film on cemented carbide by ECR plasma sputtering, which also substantiates that these kinds of carbon films are favorable to enhance the surface property of cemented carbide.

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Section: Introductionmentioning

confidence: 99%

Structure and Surface Property of Carbon Films Deposited on Cemented Carbide by Electron Cyclotron Resonance Plasma Sputtering

Liu,

Shi,

Zhu

et al. 2023

Advances in Transdisciplinary Engineering

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show abstract

“…The mechanical properties, including the tensile properties, of different kinds of DLC film have been studied in the past twenty years. [6][7][8] However, few of reports presented on micro or nano-scale, which were more close to the practical application. Among them, Smallwood et al coated a 5-nmthick DLC film on a MEMS electrostatic lateral motor and found more than 300 times of prolonged wear life.…”

Section: Introductionmentioning

confidence: 99%

Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method

Zhang

Uesugi

Hirai

et al. 2017

Jpn. J. Appl. Phys.

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This paper reports the tensile properties of single-crystal silicon (SCS) microstructures fully coated with sub-micrometer thick diamond like carbon (DLC) film using plasma enhanced chemical vapor deposition (PECVD). To minimize the deformations or damages caused by non-uniform coating of DLC, which has high compression residual stress, released SCS specimens with the dimensions of 120 µm long, 4 µm wide, and 5 µm thick were coated from the top and bottom side simultaneously. The thickness of DLC coating is around 150 nm and three different bias voltages were used for deposition. The tensile strength improved from 13.4 to 53.5% with the increasing of negative bias voltage. In addition, the deviation in strength also reduced significantly compared to bare SCS sample.

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Ion excitation and etching effects on top-surface properties of sp2 nanocrystallited carbon films

Fan

Diao

2018

Applied Surface Science

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Three-layered sandwich structured carbon film prepared by sputtering and ion/electron/ion alternative irradiation

Cited by 7 publications

References 25 publications

Structure and Surface Property of Carbon Films Deposited on Cemented Carbide by Electron Cyclotron Resonance Plasma Sputtering

Structure and Surface Property of Carbon Films Deposited on Cemented Carbide by Electron Cyclotron Resonance Plasma Sputtering

Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method

Ion excitation and etching effects on top-surface properties of sp2 nanocrystallited carbon films

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