2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2019
DOI: 10.1109/ispsd.2019.8757667
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Threshold Voltage Instability Mechanisms in p-GaN Gate AlGaN/GaN HEMTs

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Cited by 46 publications
(30 citation statements)
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“…Considering the 3 V gate stress in Fig. 7(a), the Schottky Gate GaN HEMT exhibits a positive threshold voltage shift, which is in agreement with [18]. This positive VTH shift is caused by trapping of electrons in the AlGaN/GaN interface [18].…”
Section: A Schottky Gate Gan Hemtsupporting
confidence: 57%
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“…Considering the 3 V gate stress in Fig. 7(a), the Schottky Gate GaN HEMT exhibits a positive threshold voltage shift, which is in agreement with [18]. This positive VTH shift is caused by trapping of electrons in the AlGaN/GaN interface [18].…”
Section: A Schottky Gate Gan Hemtsupporting
confidence: 57%
“…7(a), the Schottky Gate GaN HEMT exhibits a positive threshold voltage shift, which is in agreement with [18]. This positive VTH shift is caused by trapping of electrons in the AlGaN/GaN interface [18]. For the stress durations evaluated (1s to 100 s) there is no significant impact of the stress time on the threshold voltage shift, which is around +5%.…”
Section: A Schottky Gate Gan Hemtsupporting
confidence: 52%
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