Ti thin films deposited by high-power impulse magnetron sputtering in an industrial system: Process parameters for a low surface roughness

Suliali, Nyasha J.; Goosen, William E.; Vuuren, A. Janse van; Olivier, E.J.; Bakhit, Babak; Högberg, Hans; Darakchieva, Vanya; Botha, J.R.

doi:10.1016/j.vacuum.2021.110698

Cited by 12 publications

(7 citation statements)

References 60 publications

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“…Though these film thicknesses are far smaller than that in the experiments (figure 9), one can realize the evolutions of film structures as high-energy ion fraction increases are consistent in simulation and experiment. It is normally found that the grain size becomes small with the increasing substrate bias in HiPIMS Ti film deposition [61]. In our experiments, the roughly estimated high-energy ion fraction is less than 40%, according to the ionization degree and ratio J i,p /J i,n in figure 6.…”

Section: Deposition Of Ti Filmssupporting

confidence: 45%

Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Luo¹,

Han²,

Su³

et al. 2022

Plasma Sources Sci. Technol.

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As an emerging and extraordinary plasma source, bipolar pulsed high power impulse magnetron sputtering (BP-HiPIMS) discharge has been widely concerned by academia and industry due to the ability to control the deposited ion energy. In the present work, with the intension of increasing the high-energy ion fraction and flux during deposition, the BP-HiPIMS is operated together with a solenoidal coil installed in front of the target. This intension is achieved by applying a pulsed coil current so that the ions generated during the high-power negative pulse can be manipulated to diffuse towards substrate and then arrive at the substrate surface during the positive pulse. Systematic investigations of discharge characteristics and plasma parameters for Ti target discharge in Ar gas have been made, illustrating that applying a pulsed coil current prior to the positive pulse onset for ~50 μs is an optimal selection to obtain a larger fraction of high-energy ions. The complex plasma dynamics has also been explored using the particle-in-cell/Monte Carlo collision approach. To verify the statements realized by plasma measurements, the Ti films have been deposited on a floating Si substrate, whose microstructure and surface morphology are characterized by FESEM and AFM. The deposition illustrates that applying a pulsed coil current prior to the positive pulse onset for ~50 μs can prepare a thicker, denser, and smoother Ti film. The link between the plasma parameters and film microstructure is studied using the MD simulations which show that the high-energy ions contribute to optimizing the adatom diffusion and mobility on growing film surface, which is more beneficial to get a smaller grain size and decrease the film surface roughness.

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Section: Deposition Of Ti Filmssupporting

confidence: 45%

Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Luo¹,

Han²,

Su³

et al. 2022

Plasma Sources Sci. Technol.

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“…This result could be caused by the needle‐like structures as shown in the SEM micrograph of MOT‐40 TF. N.J. Suliali et al reported that the Frank‐van der Merwe (FM) growth mode leads to reducing the surface roughness of TFs 32 . S. Sönmezoğlu et al reported that the surface roughness of Te‐doped ZnO thin films decreased with increasing Te concentrations 33 .…”

Section: Resultsmentioning

confidence: 99%

Tailoring the surface properties of molybdenum oxytelluride thin films by its compositional ratio

Han,

Yoon,

Park

et al. 2024

Surface & Interface Analysis

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In this work, RF magnetron co‐sputtering was used to fabricate molybdenum oxytelluride thin films with different atomic ratios. Scanning electron micrographs and atomic force micrographs revealed that pure Mo thin films were segregated. Thin films with 40% Te content portrayed needle‐like structures and thus had the largest Rq value of 2.48 nm. Contact angle measurements further supported the findings as the thin films with 40% Te content were the most hydrophobic. X‐ray photoelectron spectroscopy results revealed that the major oxidation states of Mo from Te‐poor to Te‐rich TFs were changed from high (+6) to low (+4 and/or +2). X‐ray diffraction data showed that peaks pertaining to molybdenum oxide species appeared, notably at 33.048° and 33.115°. Ultraviolet photoelectron spectroscopy and Kelvin probe measurements evinced that the work function increases with increasing Te content. Four‐point probe measurements revealed that molybdenum oxytelluride thin films tend to have higher electrical conductivity than pure Mo and Te thin films.

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“…Surface roughness has been found to be increased by the increase in thickness of TiO 2 on Si substrate deposited by rf sputtering [8]. Also, Ti films has a non-linear dependence by the high-power impulse magnetron sputtering power on surface roughness and size of the granular structure increases with power [9]. This modifies the magnetic properties by depositing magnetic films on top of it.…”

Section: Introductionmentioning

confidence: 99%

Magnetic properties in soft (CoFeB)/hard (Co) bilayers deposited under different Ar gas pressure

Nayak

Mohanty

Singh

2022

J. Phys.: Condens. Matter

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We have studied the effect of deposition pressure on the magnetization reversal, domains, anisotropy and damping constant in the ferromagnetic (CoFeB and Co) single and bilayer samples. Hysteresis measured by magneto-optic Kerr microscopy for the single layer films prepared at higher deposition pressure indicate no change of loop shape i.e. isotropic behaviour. An enhancement of anisotropy has been observed in the bilayer samples than the single layer samples prepared at a particular deposition condition. However, increasing the deposition pressure to 50 sccm for the bilayer samples, anisotropy gets reduced. For single layer Co film deposited at 10 sccm exhibits branch and patch like domains for different angle between the easy axis and the external magnetic field. However, the Co film deposited at 50 sccm exhibits ripple like domains. In the case of single layer CoFeB, branch and patch like domains are observed deposited at 10 sccm. Patch like domains are found for the CoFeB films deposited at 50 sccm. Pinned labyrinth and ripple kind of magnetic domains along with the big branch domains are found in the bilayer samples. The pinned domains may be due to the interfacial exchange coupling. Similar values of damping constants have been observed for different thin films prepared at different deposition pressure.

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Ti thin films deposited by high-power impulse magnetron sputtering in an industrial system: Process parameters for a low surface roughness

Cited by 12 publications

References 60 publications

Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Tailoring the surface properties of molybdenum oxytelluride thin films by its compositional ratio

Magnetic properties in soft (CoFeB)/hard (Co) bilayers deposited under different Ar gas pressure

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