2021
DOI: 10.1039/d1dt00486g
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Time-dependent surface modification of uranium oxides exposed to water plasma

Abstract: Thin UO2 films exposed to water plasma under UHV conditions have been shown to be interesting models for radiation induced oxidative dissolution of spent nuclear fuel. This is partly attributed...

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Cited by 6 publications
(6 citation statements)
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“…This was attributed to the atomic hydrogen, being also being present in the pure water plasma. The effect is, though, very weak and longer exposure times than used in the present study are needed (30-60 min [27]) to observe a partial reduction of U(VI) into U(V). For mixed H 2 O/H 2 plasma, the reduction becomes more pronounced.…”
Section: Uomentioning
confidence: 65%
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“…This was attributed to the atomic hydrogen, being also being present in the pure water plasma. The effect is, though, very weak and longer exposure times than used in the present study are needed (30-60 min [27]) to observe a partial reduction of U(VI) into U(V). For mixed H 2 O/H 2 plasma, the reduction becomes more pronounced.…”
Section: Uomentioning
confidence: 65%
“…For longer exposures, U(VI) is slowly reduced back to U(V). These findings were discussed in detail and a simple kinetic model was developed to describe the dynamics of the process [27]. While we previously only used this methodology for exposures to pure water plasma [28], we have there extended in the present study the experimental conditions by using mixed H 2 O/H 2 plasma.…”
Section: Introductionmentioning
confidence: 97%
“…The authors propose that such a process would explain the absence of oxidants and oxidized uranium during the long-term leaching tests mentioned in Section 3, and leads to the overall recombination of oxidizing species in solution back to water. The formation of U(V) and subsequent reduction was recently observed at the surface of a thin UO 2 film exposed to plasma in vacuum at 400 • C [34,35]. The authors also mention the formation of a surface-bound •OH radical as an intermediate species involved in the oxidation of the UO 2 surface [34,35,69].…”
Section: Redox Conditions At the Spent Fuel Surfacementioning
confidence: 88%
“…The formation of U(V) and subsequent reduction was recently observed at the surface of a thin UO 2 film exposed to plasma in vacuum at 400 • C [34,35]. The authors also mention the formation of a surface-bound •OH radical as an intermediate species involved in the oxidation of the UO 2 surface [34,35,69].…”
Section: Redox Conditions At the Spent Fuel Surfacementioning
confidence: 88%
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