Photoluminescence (PL) of porous InP formed by electrochemical etching
techniques is measured at room temperature. Compared to the PL of the bulk InP
wafer, a blueshifted PL emission is observed. It is found that
the amount of the blueshifted energy
depends on the microstructure of porous InP, which in turn
strongly depends on the potential voltage applied during the
electrochemical etching. Time-resolved
PL study of the sample shows that surface nonradiative recombination
is dominant.