Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors

Onwudinanti, Chidozie; Brocks, G.; Koelman, Vianney; Morgan, T.W.; Tao, Shuxia

doi:10.1039/d1cp01082d

Cited by 7 publications

(22 citation statements)

References 24 publications

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“…The surface hydroxyl groups are referred to as reaction sites for the reaction illustrated in Figure B, so TDMASn forms a single monolayer on the S-1 support. The previous literature showed that the growth of SnO 2 was Stranski–Krastanov . It could be seen from the TEM that the particle size of Pt/20SnO 2 /S-1 (3.7 nm) was larger than that of Pt/20TDMASn/S-1 (2.7 nm).…”

Section: Discussionmentioning

confidence: 82%

“…The previous literature showed that the growth of SnO 2 was Stranski−Krastanov. 45 It could be seen from the TEM that the particle size of Pt/20SnO 2 /S-1 (3.7 nm) was larger than that of Pt/20TDMASn/S-1 (2.7 nm). This result corresponded to weaker interactions between the metal species and the support of Pt/20SnO 2 /S-1, which was in good agreement with the H 2 -TPR results.…”

Section: Discussionmentioning

confidence: 89%

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Small-Molecule Modification Provides Pt Nucleation Sites for Enhanced Propane Dehydrogenation Performance

Zhang

Xing

et al. 2023

J. Phys. Chem. C

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The rational synthesis of catalysts with controllable structures and the study of their structure–activity relationships to break the limitations of traditional catalysts remain challenging. Herein, tetrakis(dimethylamido)tin (TDMASn) exposures were used to modify silicalite-1 (S-1) lacking suitable chemisorption sites on their surfaces to provide Pt nucleation sites, obtaining a Pt/20TDMASn/S-1 sample. For comparison, Pt species supported on bare S-1 (Pt/S-1) and Pt species supported on the S-1 of pre-deposited SnO2 (Pt/20SnO2/S-1) were also prepared. Catalysts were characterized extensively by X-ray diffraction, temperature-programmed reduction, transmission electron microscopy, X-ray photoelectron spectroscopy, and diffuse-reflectance infrared Fourier transform spectroscopy of adsorbed CO. The results showed that this surface modification (TDMASn or SnO2) yielded up to about a 40-times increase in Pt content after 20 cycles of Pt atomic layer deposition (ALD). Compared with Pt/20SnO2/S-1, Pt/20TDMASn/S-1 had a smaller particle size, stronger interactions between the metal species and the support, and a lower Sn0 content, thus resulting in a remarkably higher initial propane conversion in the propane dehydrogenation (PDH) reaction. The catalytic activity could also be optimized based on the number of ALD-TDMASn exposures. As a consequence, Sn not only provided nucleation sites for Pt but also acted as a promoter to enhance the catalyst performance. This fundamental understanding will help researchers obtain suitable catalysts for PDH processes.

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Section: Discussionmentioning

confidence: 82%

Section: Discussionmentioning

confidence: 89%

Small-Molecule Modification Provides Pt Nucleation Sites for Enhanced Propane Dehydrogenation Performance

Zhang

Xing

et al. 2023

J. Phys. Chem. C

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“…However, the removal force for Sn from TaN remains low irrespective of the aging period and treatment temperature. On the other hand, Pb particles on TaN exhibits high removal force indicating that the Pb adheres to TaN strongly but not as high as Sn on The strong interaction of Sn on Ru surfaces as reported in the literature makes the removal of Sn contaminants difficult from the Ru substrate [16].…”

Section: Quantitative Analysis Of Removal Force For Pb and Sn Contami...mentioning

confidence: 84%

Removal behavior of Sn and Pb contaminants on EUV mask after EUV exposure

Kwon

Kang²,

Kim³

et al. 2022

Photomask Technology 2022

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Tin (Sn) and Lead (Pb) particles released from the EUV scanner can contaminate the EUV mask causing serious yield and throughput problems. These contaminants can worsen during EUV exposure and become difficult to remove, leading to damaging the EUV mask in the process. To effectively remove contaminants without substrate damage, it is necessary to understand the removal behavior of the contaminants. In this study, the removal behavior of Sn and Pb particles was studied by simulating the EUV exposure heated by rapid thermal annealing. The removal forces between the thermally aged Sn and Pb particles and EUV substrate surfaces were quantitatively measured using atomic force microscopy (AFM). With the thermal aging time, the contact area of the deformed particle increases which requires a high removal force. After particle removal, the footprint of the contaminants was investigated to understand the surface quality of where the particles sat under the various exposure conditions. This study helps to better understand the adhesion mechanism and removal behavior of thermally deformed Sn and Pb particles on different EUV substrates.

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“…The acceleration of the deuterium uptake induced by Sn, as shown in Figure 6, is qualitatively consistent with the predictions based on DFT in. 10,11 According to these studies, when a Sn atom or a Sn hydride molecule is adsorbed on the Ru(0001) surface, charge transfer from Sn to H and Ru reduces their atomic volumes, making hydrogen penetration more favorable. This also holds for a complete atomic layer of Sn on Ru because hydrogen can access the Ru lattice through the Sn layer, given the larger atom size of Sn than Ru.…”

Section: Less Than One Atomic Layer Ofmentioning

confidence: 99%

Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers

Wang,

van Kampen,

Morgan

2023

ACS Appl. Mater. Interfaces

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Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors

Abstract: A monolayer of Sn makes the Ru surface more permeable to H, but more layers inhibit H penetration.

Cited by 7 publications

References 24 publications

Small-Molecule Modification Provides Pt Nucleation Sites for Enhanced Propane Dehydrogenation Performance

Small-Molecule Modification Provides Pt Nucleation Sites for Enhanced Propane Dehydrogenation Performance

Removal behavior of Sn and Pb contaminants on EUV mask after EUV exposure

Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers

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