Abstract:State-of-the-art nanolithography machines employ extreme ultraviolet (EUV) light to pattern nanometer-scale features on silicon wafers for the production of integrated circuits. This radiation is generated in a laserproduced plasma formed on tin microdroplet targets. In this contribution, we give an overview of our recent experimental and theoretical studies on the properties of tin plasmas driven by short-wavelength lasers and the subsequent tin fluid dynamics. First, we will present a comprehensive character… Show more
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