2017
DOI: 10.1088/1757-899x/211/1/012026
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Tin sulphide prepared by sulphurisation process using metallic tin film precursor obtained from dc magnetron sputtering method

Abstract: Abstract. Thin films of tin sulphide were prepared by sulphurisation process of metallic Sn precursor at temperature of 300-500 o C in excess ambient of sulphur using a graphite box in N2 atmosphere. Sulphurisation temperature at 300 o C, the films were formed in SnS phase with orthorhombic structure. In contrast, the films were formed in SnS2 phase with hexagonal structure when sulphurisation temperature higher than 300 o C. From absorption spectra, direct band gap increased from 1.70 to 2.45 eV with increasi… Show more

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