TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition

Abstract

, Florin-Daniel Duminica. TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition. Surface and Coatings Technology, Elsevier, 2010, vol. 205, pp. 1287-1293. 10.1016/j.surfcoat.2010 Open Archive TOULOUSE Archive Ouverte (OATAO)OATAO is an open access repository that collects the work of Toulouse researchers and makes it freely available over the web where possible. Any correspondance concerning this service should be sent to the repository administrator: staff-oatao@inp-toulouse.fr. Titanium oxynitride coatings were deposited on various substrates by an original atmospheric pressure metal organic chemical vapor deposition (MOCVD) process using titanium tetra-iso-propoxide as titanium and oxygen precursors and hydrazine as a nitrogen source. The films composition was monitored by controlling the N 2 H 4 mole fraction in the initial reactive gas phase. The variation of the N content in the films results in significant changes in morphological, structural and mechanical properties. When a large excess of the nitrogen source is used the resulting film contains ca 17 at % of nitrogen and forms dense and amorphous TiO x N y films. Growth rates of these amorphous TiO 1.5 N 0.5 coatings as high as 14 μm/h were obtained under atmospheric pressure. The influence of the deposition conditions on the morphology, the structure, the composition and the growth rate of the films is presented. For the particular conditions leading to the growth of amorphous TiO 1.5 N 0.5 coatings, first studies on the mechanical properties of samples grown on stainless steel have revealed a high hardness, a low friction coefficient, and a good wear resistance in unlubricated sliding experiments against alumina which make them very attractive as protective metallurgical coatings.

Tantalum oxynitride thin films: Mechanical properties and wear behavior dependence on growth conditions

“…Titanium oxynitride thin films seem to exhibit a similar trend concerning the mechanical properties as a function of oxygen content. For titanium oxynitride films, deposited by pulsed laser deposition (PLD) [11], the hardness decreases from~15 GPa tõ 7 GPa with increasing oxygen flow rate, while the critical loads concerning the adhesion to the substrate (in particular the emergence of the first cracks) varied from 3.4 N to 1.5 N. Similar behavior is reported by F. Maury et al [12], where titanium oxynitride thin films, produced by atmospheric pressure MOCVD using tetra-iso-propoxide (TTIP) and N 2 H 4 as reactive gases, exhibit hardness values up tõ 19 GPa with the increase of the nitrogen content, while, concerning the adhesion aspect, for loads of up to 3.2 N the authors did not observe any damage on the thin films. The increase of the duty cycle during pulsed DC reactive sputtering is translated in higher oxygen content, as reported by J.-M. Chappé et al [13].…”

“…Transition metal oxynitride thin films possess the main advantage of tuning the oxygen/nitrogen content, thus leading to films suited for a large number of applications. The effect of oxygen addition to transition metal nitrides on the mechanical properties has been previously reported for molybdenum compounds [10], titanium compounds [11][12][13][14] and zirconium compounds [15][16][17], among others.…”

A comparative study of titanium nitride (TiN), titanium oxy nitride (TiON) and titanium aluminum nitride (TiAlN), as surface coatings for bio implants

“…It is argued that a (Ti,Al)N film can be used as an intervening layer to improve the biocompatibility of metal substrate in dental application. [17] and biomaterials [11], while oxygen-rich TiN x O y has been applied in thin film resistors [18], etc.…”

The effect of nanocrystallized surface on the tribocorrosion behavior of 304L stainless steel

“…Surface properties could be enhanced chemically [6][7][8], by adding a coating [9][10][11] or metallurgically [12][13][14]. The change of the surface chemistry could be realized by phosphate chemical conversion coatings [6], laser alloying [7] and nitriding [8].…”