Titanium nitride coatings on copper alloy prepared by dc reactive magnetron sputtering

Carrasco, Claudia; Segers, Luc; Benavente, B.; Vergara, Vicente

doi:10.1016/j.jmatprotec.2003.09.001

Cited by 16 publications

(7 citation statements)

References 20 publications

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“…The first deposited layer on the substrate was Ti with the last being TiN in order to improve the adhesion [21]. The change over from Ti to TiN deposition was achieved by controlling the nitrogen flow without interruption of the deposition so that a graded interface was generalized.…”

Section: Methodsmentioning

confidence: 99%

Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings

Subramanian

Ramadoss

Jayachandran

2011

Surface and Coatings Technology

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Section: Methodsmentioning

confidence: 99%

Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings

Subramanian

Ramadoss

Jayachandran

2011

Surface and Coatings Technology

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“…3 -7 There are many processes for deposition of titanium nitride on the alloys. They are chemical vapour deposition, 7,8 plasma-enhanced chemical vapour deposition, 9,10 magnetron sputtering, 11,12 ion implantation 13,14 and plasma deposition. 15 These processes are somewhat expensive owing to the requirement of high vacuum systems.…”

Section: Introductionmentioning

confidence: 99%

Nitridation of γ‐TiAl alloys by direct metal–gas reaction at 1000–1300 K

Thongtem¹,

Boonruang²,

Thongtem³

et al. 2005

Surface & Interface Analysis

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Two g-TiAl alloys, Ti-47at%Al-2at%Nb-2at%Cr (MJ12) and Ti-47at%Al-2at%Nb-2at%Mn-0.8at%TiB 2 (MJ47), were nitrided by direct metal-gas reaction at 1000-1300 K in 10 cm 3 s −1 NH 3 . X-ray diffraction revealed formation of TiN at 1100-1300 K. Knoop microhardness values of the alloys were increased with an increase in the nitridation temperature. Microhardness values of MJ12 and MJ47 with 1300 K nitridation were respectively improved to 1.65 and 1.38 times those of the controls. Nitridation depth at a variety of temperature determined by Rutherford backscattering spectrometry was increased with an increase in the temperature. Ti, Al and N concentrations at a variety of depths analysed by scanning electron microscopy and energy dispersive X-ray linescanning are also explained.

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“…An overall higher number of O vacancies in both anatase and rutile thin films are generated as compared to Ti vacancies which is likely due to lower displacement energies of O atoms as compared to Ti atoms. The vacancy generation indicates that the displaced O atoms form vacancyinterstitial pair and they can bond to other displaced O atoms in the lattice as well as to the implanted N atom [9]. The latter will result in the mixing of N 2p and O 2p states which gives rise to the enhanced photocatalytic activity as well as reduction in the band gap of TiO2 thin films [6,10].…”

Section: Fig 2: a Correlation Between The Energy Loss By Implanted Nmentioning

confidence: 99%

STRUCTURAL PROPERTIES OF NITROGEN DOPED ANATASE AND RUTILE TiO2 THIN FILMS

Aijaz

Uddin

Siddiqui

2015

JAP

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Anatase and rutile TiO2 thin films have been doped by N ion implantation. The effect of N doping on the structural changes of TiO2 thin films and its correlation to the optical and chemical properties of the films is investigated. The depth and concentration of the implanted N atoms is found not to exhibit substantial difference for anatase and rutile phases. The energy loss of the implanted N atoms correlates well to the energy gained by O and Ti atoms in the TiO2 lattice. An increased number of O vacancies are found to be generated as compared to Ti for both anatase and rutile phases. The energy loss mechanisms of the implanted N atoms together with the O vacancy generation are found to be the major driving forces for facilitating enhanced optical and chemical properties of the TiO2 thin films.Â

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Titanium nitride coatings on copper alloy prepared by dc reactive magnetron sputtering

Cited by 16 publications

References 20 publications

Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings

Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings

Nitridation of γ‐TiAl alloys by direct metal–gas reaction at 1000–1300 K

STRUCTURAL PROPERTIES OF NITROGEN DOPED ANATASE AND RUTILE TiO2 THIN FILMS

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