“…silver (bulk work function: 4.26 to 4.74 eV), copper (bulk work function: 4.53 to 4.98 eV), aluminium (bulk work function: 4.06 to 4.28 eV), poly (3,4 ethylenedioxythiophene) poly (styrenesulfonate) (PEDOT:PSS, bulk work function: 5.1 eV) [20,21]. Either one of these functional conductive materials look simple to process, but in most of the cases it is challenging to appoint and locate them (having different work functions) adjacent to the semiconductor interface layer [22]. Recently, it has been reported that MIS structures show a rectifying behaviour [23][24][25][26].…”