Liquid Ga droplets
play a double role in the self-catalyzed growth
of GaAs nanowires on Si(111) substrates covered with a native SiO
x
layer: they induce the formation of nanosized
holes in SiO
x
and then drive the uniaxial
nanowire growth directly onto the underlying Si. The independent control
of the two mechanisms is a prerequisite for mastering the growth of
nanowires, but it is challenging in a conventional growth procedure
where they both take place under the same droplets. To that end, we
have developed an in situ procedure where the Ga
droplets used for the formation of SiO
x
holes are removed before new Ga droplets drive the growth of GaAs
nanowires. In that way, it was possible to study the interaction between
Ga droplets and SiO
x
, to create holes
in SiO
x
with controlled number density
and size, and, finally, to grow GaAs nanowires only within those holes.
Our results show unprecedented control of the nanowire nucleation
with unique possibilities: (1) deliberate control of the number density
of nanowires within 3 orders of magnitude (106–109 cm–2) without patterning the substrate
and without changing the growth conditions, (2) highly synchronous
nucleation events and, thus, exceptionally narrow nanowire length
distributions (standard deviation <1% for 3 μm long nanowires),
(3) high yield of vertical nanowires up to 80% (against GaAs islands),
(4) highly reproducible results, and (5) independent control of the
nanowire diameter from the number density. We anticipate that our
methodology could be also exploited for different materials or other
types of nanostructures.