Degradation of the magnetic and tribology performances due to diffusion from carbon overcoat is one of the concerns for future magnetic recording media. In this work, a novel film structure with ruthenium (Ru) interlayer in between the magnetic layer and the carbon overcoat has been investigated. Introduction of an ultra-thin Ru diffusion barrier is aimed to prevent carbon diffusion and minimize magnetically dead layer formation. Selection of Ru film deposition process, impact of carbon on magnetic films, carbon diffusion behavior, barrier mechanism of Ru layer, characterization of carbon films deposited with Ru interlayer and their anti-corrosion performance are covered in the project. All carbon films are prepared by hot filament Plasma Enahnced Chemical Vapor Deposition, and other films are deposited by the magnetron sputtering technique. Ru films deposited at low Ar pressure and high sputtering power showed high density and low roughness. A working pressure lower than 10 mTorr and power density above 5.61 W/cm are desired for Ru film deposition as carbon diffusion barrier. With introduction of Ru as an interlayer of the carbon overcoat, the magnetic properties of CoCrTa and Co-Pt-TiC>2 films are more consistent because of impeded carbide formation and negligible carbon diffusion. Interface integrity is well maintained, and the degree of graphitization is reduced with the Ru barrier. Secondary Ion Mass Spectroscopy depth profiling studies confirm that carbon readily diffuses into the granular structure of the Co-Pt-TiC»2 film but the diffusion in Ru is limited to sub-surface. This is validated by tests at temperatures up to 200 °C. The diffusion of carbon in Co-Pt-TiCh is dominated by grain boundary diffusion but it is 5