2017
DOI: 10.1063/1.4981800
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Topography evolution of germanium thin films synthesized by pulsed laser deposition

Abstract: Germanium thin films were deposited by Pulsed Laser Deposition (PLD) onto single crystal Ge (100) and Si (100) substrates with a native oxide film on the surface. The topography of the surface was investigated by Atomic Force Microscopy (AFM) to evaluate the scaling behavior of the surface roughness of amorphous and polycrystalline Ge films grown on substrates with different roughnesses. Roughness evolution was interpreted within the framework of stochastic rate equations for thin film growth. Here the Kardar-… Show more

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Cited by 6 publications
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References 22 publications
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