1983
DOI: 10.1109/tns.1983.4333111
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Total Dose Effects in Recessed Oxide Digital Bipolar Microcircuits

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Cited by 51 publications
(8 citation statements)
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“…Pease et a/. [76] reported that the radiation-induced failure mechanism is predominantly the p-type Si inversion at the bottom of the recessed field oxide which causes buried-layerto-buried-layer channeling, or at the oxide sidewall which causes collector-to-emitter leakage (Fig. 22).…”
Section: Leakage Currentsmentioning
confidence: 99%
“…Pease et a/. [76] reported that the radiation-induced failure mechanism is predominantly the p-type Si inversion at the bottom of the recessed field oxide which causes buried-layerto-buried-layer channeling, or at the oxide sidewall which causes collector-to-emitter leakage (Fig. 22).…”
Section: Leakage Currentsmentioning
confidence: 99%
“…Comparison of the model (symbols) with experimental data (solid lines) [6] is shown for the radiation doses of 0 KRad, 20 KRad, 100 KRad, and 500 KRad. We have used the dependencies Not = 2.9 x 108holes/cm2/rad(Si) and Nit = 5.5 x 107states/cm2/rad(Si) [7].…”
Section: Results a N D Discussionmentioning
confidence: 99%
“…Radiation effects on MOSFETs have been characterized and modeled in [3,4,5] while those on a BJT have been qualitatively described in [6,7,8].…”
Section: Introductionmentioning
confidence: 99%
“…If shown in figure 78 form at thick field oxide the technology permits multiple resistors in an MOSFET which is used to evaluate total-doseepi tub, the designer may wish to provide other induced leakage [107]. tub contacts at a variety of distances from the latch path.…”
Section: Multidevice Structuresmentioning
confidence: 99%