Total film thickness controlled structural and related magnetic properties of sputtered Ni/Cu multilayer thin films

Çölmekçi, Salih; Karpuz, Ali; Köçkar, Hakan

doi:10.1016/j.jmmm.2019.01.086

Cited by 14 publications

(4 citation statements)

References 20 publications

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“…The average diameter of the grown MWCNTs on the Ni‐Cu thin films with Cu percent of 5, 40and 75% Cu were obtained to be about of100, 120 and 160 nm respectively. As it is clear from these figures, MWCNTs are not formed on the Cu NPs films and one can conclude that Cu by itself has no catalyst property in production of MWCNTs growth as was reported in reference (Çölmekçi et al, 2019). The structural properties of Ni‐Cu NPs on the amorphous hydrogenated carbon films were determined by RBS spectra, AFM images, UV–Visible spectroscopy.…”

Section: Resultssupporting

confidence: 73%

The optical density and topography characterizations of MWCNTs on Ni‐Cu/ a‐C:H substrates with different copper percentage

Dalouji

Goudarzi

Solaymani

2020

Microscopy Res & Technique

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In this article, the Ni-Cu nanoparticles (NPs) in the amorphous carbon hydrogenated thin films with different copper percentage by co-deposition of RF-plasma enhanced chemical vapor deposition were prepared using acetylene gas and Ni and Cu targets. The films deposited with 5% Cu have minimum value of the average diameter of Multi-walled Carbon Nanotubes, MWCNTs, in about of 100 nm. It can be seen that the lateral size values of the nanoparticles for films with 5% Cu have minimum value of 5.34 nm. Films deposited with 75% Cu have maximum value of optical density specially in high energy. The spectral density power of all films indicated the presence of fractal components in prominent topographies. Films deposited without Cu NPs have minimum value of fractal dimension in about of 2.96. The diagram of the bearing area versus the nanoparticles height has shown the percentage of cavities and single-layers. The single-layer contents of all films were about 95%.

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Section: Resultssupporting

confidence: 73%

The optical density and topography characterizations of MWCNTs on Ni‐Cu/ a‐C:H substrates with different copper percentage

Dalouji

Goudarzi

Solaymani

2020

Microscopy Res & Technique

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“…The importance of magnetic films in today's science and technology has been proven by many studies [1][2][3][4]. These films are produced with different production techniques [5][6][7], including the sputtering method [8,9]. Among the studies of magnetic films [7,9,10], there is a large number of investigations of Fe-containing structures.…”

Section: Introductionmentioning

confidence: 99%

Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

et al. 2023

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Taguchi method has been conducted to improve the saturation magnetisation, Ms, of Fe/Al multilayer thin films deposited using a dual-target magnetron sputtering. The Ms values were obtained from the magnetic hysteresis loops. To evaluate the influence of deposition factors on Ms by using the Taguchi method, L9 orthogonal array with three deposition factors (A -Fe deposition rate, B -Al deposition rate, and C -Fe layer thickness) was carried out with nine experiments at three levels. For the signalto-noise ratio of the "larger is the better", the improved Ms has been obtained at A3B2C3, where factor A is 0.12 nm/s, factor B is 0.03 nm/s, and factor C is 25 nm. At A3B2C3, a verification experiment was carried out with a 95% confidence level to confirm the prediction of 1597.6 emu/cm 3 , and in the experimental run, Ms, exp was found to be 1649.0 emu/cm 3 , which was an improvement from the highest initial run, i.e., Ms, ini = 1540.2 emu/cm 3 , among prescribed runs. Analysis of variance was imposed to obtain the F-ratio and contribution percentage of each deposition factor. Also, the interactions of the deposition factors were determined with response surface methodology. For the structural properties at the best factor combinations, X-ray diffraction experiments revealed that Fe/Al films at A3B2C3 were crystallised with the mixed phase of face-centred cubic and body-centred cubic structures. According to scanning electron microscope images, the film surface is almost uniformly shaped. Furthermore, the model of Ms has also been developed using regression analysis as a function of the deposition factors A, B, and C. Then, from the regression model, high statistical performance was obtained, with values of R 2 and R 2 (adj) being 100 and 100%, respectively. It is seen that the Taguchi method supported by response surface methodology, analysis of variance, and regression analysis turned out to be very successful in finding the factors with proper levels in order to improve Ms of Fe/Al multilayer thin fims within the prescribed limit. topics: Fe/Al multilayer thin films, Taguchi method, response surface method, regression analysis

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“…Morphology and electrical and optical properties of Cu nanoparticles thin layer is affected by Cu content and each of them α is effective parameter on growth of MWCNTs based on Ni nanoparticles catalyst [25]. Nickel-copper nanoparticles (Ni-Cu NPs) have attracted attention due to their potential application in magneto-optical recording, spintronic and data storage devices, interconnects, and their giant magnetoresistance (GMR) [26].…”

Section: Introductionmentioning

confidence: 99%

MWCNTs - Ni-Cu NPs @ a-C:H thin films: Study of relation between the average diameters of CNTs with optical density and topological characterizations

Goudarzi

Dalouji

2020

Preprint

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In this paper, Ni-Cu NPs @ a-C:H thin films with different content of cooper by co-deposition of RF-sputtering and RF-plasma enhanced chemical vapor deposition (RF-PECVD) were prepared from acetylene gas and Ni and Cu targets. The prepared samples as catalysts for growing multi-wall carbon nanotubes (MWCNTs) were used from liquid petroleum gas (LPG) by thermal chemical vapor deposition (TCVD) at 825 °C. The films deposited with 5% Cu have minimum value the average diameter of CNTs and were about 100 nm. The fractal dimensions and structural characteristics as well as optical density of Ni-Cu NPs thin films have been investigated. AFM images can estimate the lateral size of the nanoparticles on the films surface. These values for Ni NPs without Cu NPs @ a-C:H thin film and with Cu NPs thin film contenting 5%, 40%, 75% Cu are obtained about 7.2, 5.34, 6.04 and 11.16 nm respectively. The optical density (Dopt) of thin films was obtained from the relation Dopt = \alpha t. Films deposited with 75% Cu have maximum value of optical density specially in high energy. The spectral density power of all layers reflects the reverse flow changes,, especially in the high spatial frequency region, indicating the presence of fractal components in prominent topographies. Films deposited with 75% Cu have minimum value of fractal dimension. The diagram of the Bearing Area proportion the height shows the percentage of cavities and single-layers. It can be seen that the single-layer content of all films were about 95%.

show abstract

Total film thickness controlled structural and related magnetic properties of sputtered Ni/Cu multilayer thin films

Cited by 14 publications

References 20 publications

The optical density and topography characterizations of MWCNTs on Ni‐Cu/ a‐C:H substrates with different copper percentage

The optical density and topography characterizations of MWCNTs on Ni‐Cu/ a‐C:H substrates with different copper percentage

Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

MWCNTs - Ni-Cu NPs @ a-C:H thin films: Study of relation between the average diameters of CNTs with optical density and topological characterizations

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