2023
DOI: 10.1002/smtd.202201198
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Toward Precision Deposition of Conductive Charge‐Transfer Complex Crystals Using Nanoelectrochemistry

Abstract: The lack of understanding for precise synthesis and assembly of nano-entities remains a major challenge for nanofabrication. Electrocrystallization of a charge-transfer complex (CTC), tetrathiafulvalene bromide (TTF)Br, is studied on micro/nanoelectrodes for precision deposition of functional materials. The study reveals new insights into the entire CTC electrocrystallization process from the initial nanocluster nucleation to the final elongated crystals with hollow ends grown from the working electrode to the… Show more

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Cited by 6 publications
(7 citation statements)
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“…The fit with the Fletcher model indicates that the electrocrystallization of Co‐TCNQ at V=100 mV is limited by interfacial electrokinetic [15] . The i‐t transients from repeated experiments under the same conditions at V=100 mV (Figure S3) display similar slopes of a single nucleation event but with wide‐ranging induction times of 2–2,000 s, consistent with the stochastic nature of CTC nucleation [2w,17] . In some instances, no Co‐TCNQ nucleation was observed during the entire period of our experimental window of 3,600 s. Ex‐situ SEM imaging with elemental mapping (Figure S4) shows the presence of C, N, Co, and traces of O, consistent of the presence of Co‐TCNQ on the microelectrode surface.…”
Section: Resultssupporting
confidence: 58%
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“…The fit with the Fletcher model indicates that the electrocrystallization of Co‐TCNQ at V=100 mV is limited by interfacial electrokinetic [15] . The i‐t transients from repeated experiments under the same conditions at V=100 mV (Figure S3) display similar slopes of a single nucleation event but with wide‐ranging induction times of 2–2,000 s, consistent with the stochastic nature of CTC nucleation [2w,17] . In some instances, no Co‐TCNQ nucleation was observed during the entire period of our experimental window of 3,600 s. Ex‐situ SEM imaging with elemental mapping (Figure S4) shows the presence of C, N, Co, and traces of O, consistent of the presence of Co‐TCNQ on the microelectrode surface.…”
Section: Resultssupporting
confidence: 58%
“…Figure 3c summarizes the morphological changes during Co‐TCNQ electrocrystallization on the Pt microdisk electrode. The hollow crystal morphology, also observed in TTF‐Br electrocrystallization, has been attributed to the diffusion flux gradient across a growing crystalline face where it is the highest at the circumference than the center [2l,m,w,24] …”
Section: Resultsmentioning
confidence: 87%
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