2015
DOI: 10.1109/tasc.2014.2379092
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Towards a 100 000 TES Focal Plane Array: A Robust, High-Density, Superconducting Cable Interface

Abstract: We describe a new fabrication process carried out at the Princeton University Micro/Nano Fabrication Laboratory (MNFL) for creating high-density superconducting cables designed to interface with ACTPol (a polarization-sensitive receiver for the Atacama Cosmology Telescope) detector arrays. A polyimide substrate about 50 μm thick fabricated by spinning and furnace curing a polyimide precursor (HD Microsystems PI-2611) is used for the flexible part of the cable, which gradually transitions to a bare silicon subs… Show more

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Cited by 6 publications
(2 citation statements)
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“…Freestanding polyimide substrates are cut to size from a roll of industry‐grade 50‐µm‐thick DuPont Kapton‐E, cleaned in the same manner as glass substrates, and outgassed for 8 h under vacuum at 200 °C before metallization. To prepare spin‐coated polyimide substrates, a single layer of HD Microsystems PI2611 is spin‐coated onto a silicon carrier wafer with native oxide (as in Pappas and Li and Jackson), cured for 3 h in an N 2 environment at 350 °C, and lastly outgassed for 2 h under vacuum at 200 °C before metallization. Its final thickness (set by the spin speed of 4000 rpm) is approximately 3.5 µm.…”
Section: Zno Tfts On Plastic Substratesmentioning
confidence: 99%
“…Freestanding polyimide substrates are cut to size from a roll of industry‐grade 50‐µm‐thick DuPont Kapton‐E, cleaned in the same manner as glass substrates, and outgassed for 8 h under vacuum at 200 °C before metallization. To prepare spin‐coated polyimide substrates, a single layer of HD Microsystems PI2611 is spin‐coated onto a silicon carrier wafer with native oxide (as in Pappas and Li and Jackson), cured for 3 h in an N 2 environment at 350 °C, and lastly outgassed for 2 h under vacuum at 200 °C before metallization. Its final thickness (set by the spin speed of 4000 rpm) is approximately 3.5 µm.…”
Section: Zno Tfts On Plastic Substratesmentioning
confidence: 99%
“…o C, TFT fabrication on polyimide is possible with very few alterations compared to processing on glass. To prepare 3.5-μm-thick polyimide foil substrates, a single layer of HD Microsystems PI2611 is spin-coated onto a silicon carrier wafer (as in [8,9]), cured in a nitrogen environment, and lastly outgassed in a vacuum oven prior to TFT fabrication. Fabrication proceeds directly on the fresh polyimide surface.…”
Section: Zno/al2o3 Fabricated At Plastic-compatible Temperaturesmentioning
confidence: 99%