“…15,[26][27][28][29][30] A wide variety of techniques to deposit the top metal electrode onto a molecular monolayer have been described in the literature including direct and indirect evaporation, 11,[31][32][33][34][35][36][37][38] use of liquid metals, 11,34,39,40 flip chip lamination, 34,41 electrodeposition, [42][43][44] surface-diffusion-mediated deposition, 44 chemisorption of metal nanoparticles onto surface-functionalised monolayers, 45 thermal induced decomposition of an organometallic monolayer, 46 and photoreduction of a metal precursor. 47,48 The most significant problems in the deposition of the top-contact electrode are those related to damage of the functional molecules during the metallization process of the monolayer or penetration of the growing top-contact through the monolayer, which results in short circuits. In addition, many of the proposed 'soft' methods that avoid penetration of the growing metal electrode through the monolayer result in a relatively low surface coverage of the monolayer by the newly fashioned top contact.…”