2018
DOI: 10.1016/j.surfcoat.2017.12.030
|View full text |Cite
|
Sign up to set email alerts
|

Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2018
2018
2023
2023

Publication Types

Select...
8

Relationship

2
6

Authors

Journals

citations
Cited by 18 publications
(4 citation statements)
references
References 53 publications
0
4
0
Order By: Relevance
“…The LMR-satisfying properties of non-annealed, as fabricated ITO films are attributed to unique advantages of the applied discharge during deposition process. Our previous research clearly showed that optimization of the deposition pressure 0.5 Pa < p < 1.0 Pa induces collisions of the sputtered particles [ 28 , 29 ]. The application of magnetron sputtering is advantageous and allows to tailor the optical and electrical properties of the deposited ITO films with no additional post-deposition annealing as it is often required in case of other deposition methods [ 30 ].…”
Section: Resultsmentioning
confidence: 99%
“…The LMR-satisfying properties of non-annealed, as fabricated ITO films are attributed to unique advantages of the applied discharge during deposition process. Our previous research clearly showed that optimization of the deposition pressure 0.5 Pa < p < 1.0 Pa induces collisions of the sputtered particles [ 28 , 29 ]. The application of magnetron sputtering is advantageous and allows to tailor the optical and electrical properties of the deposited ITO films with no additional post-deposition annealing as it is often required in case of other deposition methods [ 30 ].…”
Section: Resultsmentioning
confidence: 99%
“…Next, ITO overlays were deposited on the fibers using standard planar magnetron with unbalanced magnetic field. The deposition system used sputtering gun running in continuous RF power mode only and equipped with ITO target composed of In 2 O 3 −SnO 2 90–10 wt% and with purity of 99.99 % employing a similar concept as in our previous work . In this experiment, to increase RI sensitivity of the ITO‐LMR sensor, the overlay thickness was reduced to observe the lowest possible order of LMR resonances .…”
Section: Methodsmentioning
confidence: 99%
“…Recently, high power impulse magnetron sputtering (HiPIMS) is emerging as a method for deposition of metal oxide films, including ITO films [13][14][15][16][17]. The high power impulses can generate high-density plasma containing highly excited/ionized sputtered species and reactive agents (oxygen radicals), favoring the synthesis of compounds.…”
Section: Introductionmentioning
confidence: 99%