Towards large area deposition of Cr2AlC on steel

Walter, C.; Sigumonrong, Darwin P.; El‐Raghy, T.; Schneider, Jochen M.

doi:10.1016/j.tsf.2005.12.219

Cited by 146 publications

(140 citation statements)

References 20 publications

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“…The same effects were demonstrated recently by combined experimental and simulation studies by Neidhardt et al [121] for sputtering from Ti-B targets of several compositions. These results also provide a possible reason for the apparent differences between sputtering from Ti 2 AlC and Cr 2 AlC targets [98,110,111], namely that the emission characteristics of the elements may vary depending on the target. This would not be surprising, since it is known that Ti 2 AlC and Cr 2 AlC have different bonding character [122,123,124,125,126].…”

mentioning

confidence: 78%

“…On the synthesis side, research directions that should be pursued further include low-temperature deposition of MAX phases, where novel approaches to reduce the deposition temperature below the present 450 °C [98,99] would be important for widespread applications. Note, however, that there have been several unsubstantiated claims of MAX-phase thin-film synthesis at temperatures of 100-300 °C (see section 4.2.1).…”

Section: Discussionmentioning

confidence: 99%

“…section 4.2.1), yielding Al-deficient films at high temperature (above 700 °C). However, sputtering from a Cr 2 AlC target has been reported to yield a film composition reasonably close to that of the target, with films consisting mainly of Cr 2 AlC [98,112], although no results on the homogeneity in the film composition was presented. Recent preliminary results on industrial-scale deposition of Cr 2 AlC from Cr 2 AlC targets showed strong inhomogeneity in the film composition [114].…”

Section: Sputtering With Compound Targetsmentioning

confidence: 99%

“…The lowest reliable reported deposition temperature for MAX phases remains 450 °C for V 2 GeC and Cr 2 AlC [98,99].…”

Section: Temperature Ranges For Max-phase Synthesismentioning

confidence: 99%

“…Instead, the temperature range in which polycrystalline growth of relatively phase-pure MAX phases can be obtained is increased. Examples include deposition of Ti 3 SiC 2 on bulk Ti 3 SiC 2 (which gives local homoepitaxial growth [102]) and Cr 2 AlC onto steel [98]. One important aspect that has not been investigated for MAX phases is whether local epitaxial growth can also be obtained for important technological substrates such as steel (from a technological point of view, local epitaxy would be important for adhesion).…”

Section: Growth Mode As a Function Of Temperaturementioning

confidence: 99%

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The M+1AX phases: Materials science and thin-film processing

et al. 2010

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This article is a critical review of the M n+1 AX n phases ("MAX phases", where n =1, 2, or 3) from a materials science perspective. MAX phases are a class of hexagonal-structure ternary carbides and nitrides ("X") of a transition metal ("M") and an A-group element. The most well known are Ti 2 AlC, Ti 3 SiC 2 , and Ti 4 AlN 3 . There are ~60 MAX phases with at least 9 discovered in the last five years alone. What makes the MAX phases fascinating and potentially useful is their remarkable combination of chemical, physical, electrical, and mechanical properties, which in many ways combine the characteristics of metals and ceramics. For example, MAX phases are typically resistant to oxidation and corrosion, elastically stiff, but at the same time they exhibit high thermal and electrical conductivities and are machinable. These properties stem from an inherently nanolaminated crystal structure, with M n+1 X n slabs intercalated with pure A-element layers. The research on MAX phases has been accelerated by the introduction of thin-film processing methods.Magnetron sputtering and arc deposition have been employed to synthesize single-crystal material by epitaxial growth, which enables studies of fundamental materials properties. However, the surface-initiated decomposition of M n+1 AX n thin films into MX compounds at temperatures of 1000-1100 °C is much lower than the decomposition temperatures typically reported for the corresponding bulk material. We also review the prospects for low-temperature synthesis, which is essential for deposition of MAX phases onto technologically important substrates. While deposition of MAX phases from the archetypical Ti-Si-C and Ti-Al-N systems typically require synthesis temperatures of ~800 °C, recent results have demonstrated that V 2 GeC and Cr 2 AlC can be deposited at ~450 °C. Also, thermal spray of Ti 2 AlC powder has been used to produce thick coatings. We further treat progress in the use of first-principles calculations for predicting hypothetical MAX phases and their properties. Together with advances in processing and materials 3 analysis, this progress has led to recent discoveries of numerous new MAX phases such as Ti 4 SiC 3 , Ta 4 AlC 3 , and Ti 3 SnC 2 . Finally, important future research directions are discussed. These include charting the unknown regions in phase diagrams to discover new equilibrium and metastable phases, as well as research challenges in understanding their physical properties, such as the effects of anisotropy, impurities, and vacancies on the electrical properties, and unexplored properties such as superconductivity, magnetism, and optics. 4

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