Traceable quantitative analysis of Ag _x Cu_1−x alloy films by ID ICP-MS, RBS and MEIS

Abstract

The measurement traceability of Rutherford backscattering spectroscopy (RBS), medium energy ion scattering spectroscopy (MEIS) and isotope dilution inductively coupled plasma mass spectrometry (ID ICP-MS) was compared for the quantitative analysis of alloy thin films. A set of thin Ag x Cu 1−x alloy films were selected as a model alloy system for the quantitative analysis of MEIS and ID ICP-MS. Two sets of five Ag x Cu 1−x alloy films with different mole fractions were grown on Si (100) wafers by ion beam sputter deposition. The mole fractions of thick Ag x Cu 1−x alloy films (100 nm) measured by RBS and ID ICP-MS showed a great agreement within 0.4% difference. The mole fractions of thin Ag x Cu 1−x alloy films (10 nm) measured with MEIS and ID ICP-MS also showed a small difference of about 1.0%. As a result, ID ICP-MS, RBS and MEIS can be used to certify the mole fractions of thin alloy reference films. ID ICP-MS is an absolute method for the mole fraction analysis of thin Ag x Cu 1−x alloy films. Although the contribution of sample homogeneity was included, the uncertainties of ID ICP-MS results were much smaller than those of RBS and MEIS.

Atomic spectrometry update: review of advances in the analysis of metals, chemicals and materials

“…The capability of isotope-dilution (ID)-ICP-MS, Rutherford Backscattering Spectroscopy (RBS) and Medium Energy Ion Scattering Spectroscopy (MEIS) for the analysis of silver – copper (Ag x Cu 1−x ) thin films was demonstrated by Kim et al 206 Two sets of five thin films of different mole fractions were prepared by ion beam sputter deposition onto silicon wafers. Nominally, the films ranged from Ag 0.14 Cu 0.86 to Ag 0.72 Cu 0.28 .…”