2005
DOI: 10.1016/j.microrel.2004.04.026
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Transient analysis of the impact stage of wirebonding on Cu/low-K wafers

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Cited by 26 publications
(2 citation statements)
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“…The material effect of bond wire on a Cu low-K structure was presented by Degryse et al using implicit time integration method [5]. The same method was used by Yeh et al [6,7] in conducting stress comparison between the impact and ultrasonic vibration stages of the Cu low-K structure during gold wire bonding.…”
Section: Introductionmentioning
confidence: 99%
“…The material effect of bond wire on a Cu low-K structure was presented by Degryse et al using implicit time integration method [5]. The same method was used by Yeh et al [6,7] in conducting stress comparison between the impact and ultrasonic vibration stages of the Cu low-K structure during gold wire bonding.…”
Section: Introductionmentioning
confidence: 99%
“…1 The number of wire bonding applications that are utilizing materials such as Cu wire [2][3][4][5][6][7][8][9] and low-k substrates [10][11][12] is increasing, due to the benefits of lower cost and higher performance, respectively. However, higher stresses result when bonding Cu wire; and low-k substrates are sensitive to high stresses; both of these factors result in increased rates of IC defects such as chip cratering.…”
Section: Introductionmentioning
confidence: 99%