Transient characteristics of carrier transport in an isotopically enriched 28Si/SiGe undoped heterostructure

Abstract

An isotopically enriched 28Si/SiGe undoped heterostructure is a promising platform for Si-based qubits due to the long coherence time by reducing 29Si isotopes with non-zero nuclear spins. Carriers in the buried Si quantum well (QW) of the Si/SiGe heterostructures could tunnel to the oxide/Si interface, increasing charge noise and leading to charge instability. In this work, we investigate the tunneling effects on carrier distribution and transport properties in an isotopically enriched 28Si/SiGe undoped heterostructure and its transient characteristics by controlling the hold time of gate biasing under different drain biases. By holding the gate bias for a longer time, the drain is reduced since more carriers in the buried QW tunnel to the oxide interface. Furthermore, under a larger drain bias, more carriers can move across the Si/SiGe heterojunction to the oxide interface and are trapped, resulting in a stronger current reduction, which is explained by a lucky electron model.