1992
DOI: 10.1103/physrevb.46.14362
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Transient thermal process after a high-energy heavy-ion irradiation of amorphous metals and semiconductors

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Cited by 653 publications
(289 citation statements)
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“…Most theoretical analyses of the amorphization cross-section are based on the thermal spike approach [17,19]. However, the significant contribution of the halo in the near-threshold region strongly suggests that one should invoke cumulative models that are consistent with the dual core/ halo morphology of the tracks.…”
Section: Physical Implications On the Structure And Mechanisms Of Shimentioning
confidence: 99%
See 1 more Smart Citation
“…Most theoretical analyses of the amorphization cross-section are based on the thermal spike approach [17,19]. However, the significant contribution of the halo in the near-threshold region strongly suggests that one should invoke cumulative models that are consistent with the dual core/ halo morphology of the tracks.…”
Section: Physical Implications On the Structure And Mechanisms Of Shimentioning
confidence: 99%
“…It has been widely documented that the impacts of swift heavy ions (where the electronic stopping regime dominates) on several dielectric targets generate individual tracks along the trajectory, whenever a certain threshold stopping power is overcome [14][15][16]. These observations are often explained through a thermal spike approach involving lattice melting and re-solidification of the heated material around the ion trajectory [17,18]. More recently, a different theoretical scheme has been developed for some crystals (e.g., LiNb0 3 ) in which the damage process, including track formation, is analyzed as a cumulative process that occurs via formation of point defects.…”
Section: Introductionmentioning
confidence: 99%
“…The later stages of ion track formation, after the initial electronic excitation, are well described by a thermal spike mechanism. 1,2 Within this formalism, the materialspecific electron-phonon coupling governs the transfer of the deposited energy to the target atoms, which induces a local increase in the lattice temperature. For sufficiently high electronic energy deposition, the melting temperature of the substrate can be exceeded, and a molten zone is formed along the ion trajectory.…”
Section: Introductionmentioning
confidence: 99%
“…The first included the excitation of electrons due to the ion energy deposition. The electron dynamics were then followed by combining a MC approach [15] and TTM [16][17][18]. While the MC method is a kinetic means of modeling the initial electron excitation and the nonequilibrium electron dynamics, the TTM describes the energy transport within the electronic and lattice subsystems.…”
mentioning
confidence: 99%