“…A buried dynamic near-critical electron-hole plasma, supporting interfacial plasmon-polaritons during the bulk refractive-index difference (RID) laser inscription, could be produced either in pre-filamentation (linear/geometrical focusing) [ 11 ] or in filamentation (non-linear self-focusing) regimes [ 12 ]. Importantly, nano/microscale damage morphologies—nano- [ 1 , 3 ] and microcavities [ 13 , 14 ], microtracks [ 12 ], etc., accompanying the pre- or filamentation regimes, could be managed by laser pulse wavelength, energy, width and focusing conditions via filamentation and laser-deposited energy density control [ 6 , 15 , 16 ] in order to reduce scattering losses and boost the related functional modalities (e.g., RID amplitude and thickness T ). However, the current understanding of the role of filamentation and basic physical processes underlying ultrashort-pulse laser inscription of birefringent nanolattices in bulk dielectrics is still challenging and controversial [ 1 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 11 , 14 ].…”