2015
DOI: 10.1364/oe.23.016993
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Transition and self-healing process between chaotic and self-organized patterns observed during femtosecond laser writing

Abstract: Abstract:We report evidence of intermittent behavior between chaotic and self-organized patterns while writing lines with a femtosecond lasers on the surface of a fused silica substrate. The patterns are accompanied by resolidified sub-microspheres and non-aligned grating lamellae. We observe that such dynamic behavior exhibits a striking similarity with the fluctuating content of a queuing system which alternate between random busy and idle periods.

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Cited by 7 publications
(3 citation statements)
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“…It is worth noting that the observed switching from the damage-like to nanograting modification is different from the transition and self-healing process of nanogratings that is dependent on the randomness of crack initiation in glass 42 . This transition can revert back from one state to another simply by continuing the writing process, while the transition observed in our experiment is irreversible.…”
Section: Discussionmentioning
confidence: 86%
“…It is worth noting that the observed switching from the damage-like to nanograting modification is different from the transition and self-healing process of nanogratings that is dependent on the randomness of crack initiation in glass 42 . This transition can revert back from one state to another simply by continuing the writing process, while the transition observed in our experiment is irreversible.…”
Section: Discussionmentioning
confidence: 86%
“…A buried dynamic near-critical electron-hole plasma, supporting interfacial plasmon-polaritons during the bulk refractive-index difference (RID) laser inscription, could be produced either in pre-filamentation (linear/geometrical focusing) [ 11 ] or in filamentation (non-linear self-focusing) regimes [ 12 ]. Importantly, nano/microscale damage morphologies—nano- [ 1 , 3 ] and microcavities [ 13 , 14 ], microtracks [ 12 ], etc., accompanying the pre- or filamentation regimes, could be managed by laser pulse wavelength, energy, width and focusing conditions via filamentation and laser-deposited energy density control [ 6 , 15 , 16 ] in order to reduce scattering losses and boost the related functional modalities (e.g., RID amplitude and thickness T ). However, the current understanding of the role of filamentation and basic physical processes underlying ultrashort-pulse laser inscription of birefringent nanolattices in bulk dielectrics is still challenging and controversial [ 1 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 11 , 14 ].…”
Section: Introductionmentioning
confidence: 99%
“…When optimal irradiation parameters are used, the laser-induced modification enhances the local etchability of the silica by up to three orders of magnitude [15,16], allowing the laser-inscribed material to be subsequently removed in a second, chemical etching step. Within the last two decades, collaborative efforts towards better understanding the light-matter interactions [17][18][19] and chemical etching mechanisms [20] and advanced writing techniques [21,22] have established ULAE as a capable manufacturing method for complex glass microcomponents and systems [23,24]. Recently, ULAE has shifted away from using the widely adopted but notoriously hazardous etching agent hydrofluoric acid (HF) to potassium hydroxide (KOH), making the technique much more appealing for industry-level manufacturing.…”
Section: Introductionmentioning
confidence: 99%