2022
DOI: 10.1039/d2cp00188h
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Transition between growth of dense and porous films: theory of dual-layer SEI

Abstract: The film-growth model predicts a morphology-driven dual-layer structure due to slowing down of electron diffusion through the SEI.

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Cited by 13 publications
(12 citation statements)
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“…(2) For smaller stripping current densities, notches can more easily occur and are thus more likely to occur. As discussed above, local variations play a lesser role at higher stripping current densities. Thus, higher stripping current densities can mitigate the emergence of notches and thus can lead to less isolated lithium.…”
Section: Results and Discussionmentioning
confidence: 97%
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“…(2) For smaller stripping current densities, notches can more easily occur and are thus more likely to occur. As discussed above, local variations play a lesser role at higher stripping current densities. Thus, higher stripping current densities can mitigate the emergence of notches and thus can lead to less isolated lithium.…”
Section: Results and Discussionmentioning
confidence: 97%
“…For this simulation, we choose the stripping current density to be J = J 0 . In this scenario, the local variations of interfacial tension become irrelevant and the local stripping current density variations are negligible. Therefore, the lithium–SEI bond breaking occurs homogeneously; see Figure b,c. During stripping, the whisker is thinned until it is dissolved, as depicted in Figure d,e.…”
Section: Results and Discussionmentioning
confidence: 99%
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“…Despite a lot of effort that has been going into the theoretical and experimental investigation of the SEI for many years, the SEI is still not fully understood [5,6,7]. This results from the complexity of the SEI due to the variety of organic and inorganic SEI components [8,9,10], mixed layered and mosaic SEI structures [11,12,13,14,15], a heterogeneous SEI morphology [16,17,18], and the contribution of different SEI formation reactions to the evolution of the SEI [19,20,21,22,23].…”
Section: Introductionmentioning
confidence: 99%