Abstract:Non-volatile resistance change under electric stimulation in many metal-oxides is a promising path to next generation memory devices. However, the underlying mechanisms are still not fully understood. in situ transmission electron microscopy experiments provide a powerful tool to elucidate these mechanisms. In this contribution, we demonstrate a TEM lamella geometry for in situ biasing with two xed electrode contacts ensuring low and stable contact resistances. We use Pr 1−x Ca x MnO 3−δ sandwiched by Pt elect… Show more
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