Transparent thin films of indium tin oxide: Morphology–optical investigations, inter dependence analyzes

Prepelita, Petronela; Filipescu, M.; Stavarache, Ionel; Garoi, F.; Crǎciun, D.

doi:10.1016/j.apsusc.2017.02.106

Cited by 50 publications

(32 citation statements)

References 24 publications

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“…The presence of the pillars lead, as was expected, to a roughness increase. In the case of the ITO/glass sample, the RMS value is lower in comparison with other values calculated for ITO films prepared by other methods [8], but it is comparable with those reported for ITO films grown by PLD, as this technique offers the possibility to obtain TCO films with a smooth surface when the deposition is made at low temperature and with a low laser fluency [19,39].…”

Section: Resultssupporting

confidence: 84%

“…Regarding the lowering of the band gap value of ITO film deposited on the nanopatterned glass substrate, a similar effect, related to oxygen deficiency, was observed for the ITO deposited by spin-coating on self-assembled polymer nanopattern [41]. deposited by PLD or by magnetron sputtering [8,19]. The interference characteristics are also observed in the UV-VIS spectra of the ITO film deposited on nanopatterned glass substrate.…”

Section: Resultssupporting

confidence: 65%

“…The ITO film deposited on flat glass substrate presents a transmittance over 80% between 600 and 1100 nm, with the interference maxima and minima exhibited in the visible range being typical for the films with similar thickness (~340 nm) The optical properties are presented in Figures 9 and 10. The ITO film deposited on flat glass substrate presents a transmittance over 80% between 600 and 1100 nm, with the interference maxima and minima exhibited in the visible range being typical for the films with similar thickness (~340 nm) deposited by PLD or by magnetron sputtering [8,19]. The interference characteristics are also observed in the UV-VIS spectra of the ITO film deposited on nanopatterned glass substrate.…”

Section: Resultsmentioning

confidence: 81%

“…Other ITO properties are linked to surface roughness, work function, mechanical characteristics, and environmental stability. The attributes of ITO layers are strongly influenced by the deposition techniques involved in TCO fabrication [5], the most used methods being magnetron sputtering [8,9], oxygen ion beam assisted deposition [10,11], chemical vapor deposition (CVD) [12,13], and pulsed laser deposition (PLD) [14,15]. The PLD method results in TCO coatings with appropriate electrical and optical properties [1], with its major advantage being the preservation of the target chemical composition in the transferred films.…”

Section: Introductionmentioning

confidence: 99%

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Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates

et al. 2018

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Indium tin oxide (ITO) thin films were grown on nanopatterned glass substrates by the pulsed laser deposition (PLD) technique. The deposition was carried out at 1.2 J/cm2 laser fluence, low oxygen pressure (1.5 Pa) and on unheated substrate. Arrays of periodic pillars with widths of ~350 nm, heights of ~250 nm, and separation pitches of ~1100 nm were fabricated on glass substrates using UV nanoimprint lithography (UV-NIL), a simple, cost-effective, and high throughput technique used to fabricate nanopatterns on large areas. In order to emphasize the influence of the periodic patterns on the properties of the nanostructured ITO films, this transparent conductive oxide (TCO) was also grown on flat glass substrates. Therefore, the structural, compositional, morphological, optical, and electrical properties of both non-patterned and patterned ITO films were investigated in a comparative manner. The energy dispersive X-ray analysis (EDX) confirms that the ITO films preserve the In2O3:SnO2 weight ratio from the solid ITO target. The SEM and atomic force microscopy (AFM) images prove that the deposited ITO films retain the pattern of the glass substrates. The optical investigations reveal that patterned ITO films present a good optical transmittance. The electrical measurements show that both the non-patterned and patterned ITO films are characterized by a low electrical resistivity (<2.8 × 10−4). However, an improvement in the Hall mobility was achieved in the case of the nanopatterned ITO films, evidencing the potential applications of such nanopatterned TCO films obtained by PLD in photovoltaic and light emitting devices.

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Section: Resultssupporting

confidence: 84%

Section: Resultssupporting

confidence: 65%

Section: Resultsmentioning

confidence: 81%

Section: Introductionmentioning

confidence: 99%

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Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates

et al. 2018

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“…Optical target optimization simulation requires the knowledge of optical parameters of the materials. The refractive index n and extinction coefficient k dependence on the wavelength  (nm) for all the materials in this study can be obtained from the pioneer published works [32][33][34], as shown in Fig. 2.…”

Section: Principlementioning

confidence: 99%

Improving External Quantum Efficiency by Subwavelength Nano Multi-Layered Structures for Optoelectronic Devices

Wang

Zhou

et al. 2020

IEEE Access

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Based on thin film optics (TFO) and finite element method (FEM), we have theoretically investigated improving external quantum efficiency (EQE) by anti-reflection (AR) films constructed from subwavelength nano multi-layers (NML) of low and high index materials, where the low and high index materials are MgF2 and Ta2O5, respectively. This kind of NML dielectric structures have the advantages of low-cost and flexible. Three kinds of substrates have been studied here, which are glass, polyethylene naphthalate (PEN), and polyethylene terephthalate (PET), respectively. TFO theory has been used to obtain the transmittance and reflectance, which agrees well with FEM results. For NML structure, TFO is more efficient than FEM in terms of calculation time and accuracy. The average AR effects (AAREs) are about 3.69%, 3.46% and 3.07% on glass substrate, about 6.15%, 5.56% and 5.02% on PEN substrate, and about 5.06%, 4.62% and 4.17% on PET substrate, for AR bands (ARBs) 350~800 nm, 350~1100 nm and 350~1500 nm, respectively. The results also reflect that wider AR bandwidth needs more NML layers. In practice, this kind of AR films can be widely applicable to enhance the EQE of the optoelectronic devices (OEDs). INDEX TERMS Anti-reflection, nano multi-layers, thin film optics, finite element method.

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Development of Flexible Electronics Packaging Technology

Rao

2024

Flexible Electronic Packaging and Encapsulation Technology

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Transparent thin films of indium tin oxide: Morphology–optical investigations, inter dependence analyzes

Cited by 50 publications

References 24 publications

Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates

Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates

Improving External Quantum Efficiency by Subwavelength Nano Multi-Layered Structures for Optoelectronic Devices

Development of Flexible Electronics Packaging Technology

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