2008 International Conference on Simulation of Semiconductor Processes and Devices 2008
DOI: 10.1109/sispad.2008.4648248
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Transport masses in strained silicon MOSFETs with different channel orientations

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“…atomistic) have been performed in strained nano-scaled field-effect transistors. Being an atomistic approach, the TB approach overcomes the EFA and allows to define atomic details, such as spin degeneracy removal in QW with odd numbers of atomic layers [37]. The drawback of the TB approach is the large number of parameters needed to accurately reproduce the overall bandstructure, specially in strained semiconductors.…”
Section: Comparison With Other Approachesmentioning
confidence: 99%
See 1 more Smart Citation
“…atomistic) have been performed in strained nano-scaled field-effect transistors. Being an atomistic approach, the TB approach overcomes the EFA and allows to define atomic details, such as spin degeneracy removal in QW with odd numbers of atomic layers [37]. The drawback of the TB approach is the large number of parameters needed to accurately reproduce the overall bandstructure, specially in strained semiconductors.…”
Section: Comparison With Other Approachesmentioning
confidence: 99%
“…We have compared the predictions of the present full-zone k.p-EFA to the TB ones and an excellent agreement was found in various 2D-systems. Extensive comparisons between these two models are in progress, and a series of results have been presented elsewhere; in FD MOSFETs [37], in Ge Quantum Well [30] and in Si/ SiGe heterostructures [40].…”
Section: Comparison With Other Approachesmentioning
confidence: 99%